外延 AlBN/β-Nb2N 铁电/超导体异质结构

IF 2.5 4区 物理与天体物理 Q3 MATERIALS SCIENCE, MULTIDISCIPLINARY Physica Status Solidi-Rapid Research Letters Pub Date : 2024-07-25 DOI:10.1002/pssr.202400157
Chandrashekhar Savant, Thai‐Son Nguyen, Saurabh Vishwakarma, Joongwon Lee, Anand Ithepalli, Yu‐Hsin Chen, Kazuki Nomoto, Farhan Rana, David J. Smith, Huili Grace Xing, Debdeep Jena
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引用次数: 0

摘要

我们报告了 AlBN/β-Nb2N 氮化物外延异质结构的生长过程,其中 AlBN 具有铁电性,而在 300 K 时金属电阻率≈40 μ 的 β-Nb2N 在 TC ≈ 0.5 K 以下会变得超导。我们采用氮等离子体分子束外延技术,在 c 平面 Al2O3 基底上生长出六边形的 β-Nb2N 薄膜,然后再生长出玻方 AlBN。AlBN 与 β-Nb2N 呈外延排列和旋转排列,两个氮化物层的六方晶格与 Al2O3 基底的六方晶格成 30° 角。AlBN 层的 B 成分变化范围为 0% 至 14.7%。结果发现,硼含量与硼通量的关系不大,但随着生长温度的降低,硼含量会大幅增加,这表明生长是受反应速率控制的。硼含量的增加导致 AlBN 的 a-晶格常数发生非单调变化,c-晶格常数发生单调下降。透射电子显微镜观察到尖锐、突变的 AlBN/β-Nb2N/Al2O3 外延异质结界面和紧密的对称匹配。在外延氮化物异质结构中观察到铁电性和超导性为新型电子和量子器件开辟了道路。
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Epitaxial AlBN/β‐Nb2N Ferroelectric/Superconductor Heterostructures
We report the growth of AlBN/β‐Nb2N nitride epitaxial heterostructures in which the AlBN is ferroelectric, and β‐Nb2N with metallic resistivity ≈40 μ at 300 K becomes superconducting below TC ≈ 0.5 K. Using nitrogen plasma molecular beam epitaxy, we grow hexagonal β‐Nb2N films on c‐plane Al2O3 substrates, followed by wurtzite AlBN. The AlBN is in epitaxial registry and rotationally aligned with the β‐Nb2N, and the hexagonal lattices of both nitride layers make angles of 30° with the hexagonal lattice of the Al2O3 substrate. The B composition of the AlBN layer is varied from 0 to 14.7%. It is found to depend weakly on the B flux, but increases strongly with decreasing growth temperature, indicating a reaction rate‐controlled growth. The increase in B content causes a non‐monotonic change in the a‐lattice constant and a monotonic decrease in the c‐lattice constant of AlBN. Sharp, abrupt epitaxial AlBN/β‐Nb2N/Al2O3 heterojunction interfaces and close symmetry matching are observed by transmission electron microscopy. The observation of ferroelectricity and superconductivity in epitaxial nitride heterostructures opens avenues for novel electronic and quantum devices.
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来源期刊
Physica Status Solidi-Rapid Research Letters
Physica Status Solidi-Rapid Research Letters 物理-材料科学:综合
CiteScore
5.20
自引率
3.60%
发文量
208
审稿时长
1.4 months
期刊介绍: Physica status solidi (RRL) - Rapid Research Letters was designed to offer extremely fast publication times and is currently one of the fastest double peer-reviewed publication media in solid state and materials physics. Average times are 11 days from submission to first editorial decision, and 12 days from acceptance to online publication. It communicates important findings with a high degree of novelty and need for express publication, as well as other results of immediate interest to the solid-state physics and materials science community. Published Letters require approval by at least two independent reviewers. The journal covers topics such as preparation, structure and simulation of advanced materials, theoretical and experimental investigations of the atomistic and electronic structure, optical, magnetic, superconducting, ferroelectric and other properties of solids, nanostructures and low-dimensional systems as well as device applications. Rapid Research Letters particularly invites papers from interdisciplinary and emerging new areas of research.
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