用碳基纳米材料进行低压单原子电子显微镜观察

IF 2.5 3区 工程技术 Q1 MICROSCOPY Micron Pub Date : 2024-08-25 DOI:10.1016/j.micron.2024.103706
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引用次数: 0

摘要

材料的特性与其原子尺度的结构密切相关。要全面了解原子尺度的结构与性质之间的关系,就需要先进的成像和光谱技术。在过去几十年中,像差校正扫描透射电子显微镜(STEM)得到了快速发展,目前已被常规用于原子尺度表征。然而,由于单个原子产生的信号极其微弱,单原子水平的 STEM 定量成像和光谱分析极具挑战性,因此对分析灵敏度提出了严格的要求。本综述讨论了具有单原子灵敏度的低电压 STEM 技术的开发和应用,主要基于最近在第五届 2D23 SALVE 研讨会上发表的特邀演讲,包括环形暗场 (ADF) 成像、功能成像和电子能量损失光谱 (EELS) 分析。碳基纳米材料因其在低加速电压下的结构稳定性及其丰富的物理和化学特性,被选为演示单原子 STEM 成像和 EELS 分析能力的模型系统。此外,本综述还总结了低压单原子 STEM 成像和光谱学在功能材料研究中的最新进展和应用,并讨论了未来的发展前景。
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Low-voltage single-atom electron microscopy with carbon-based nanomaterials

The properties of materials are strongly correlated with their atomic scale structures. Achieving a comprehensive understanding of the atomic-scale structure-property relationship requires advancements of imaging and spectroscopy techniques. Aberration-corrected scanning transmission electron microscopy (STEM) has seen rapid development over the past decades and is now routinely employed for atomic-scale characterization. However, quantitative STEM imaging and spectroscopy analysis at the single-atom level is challenging due to the extremely weak signals generated from individual atom, thus imposing stringent requirements for analysis sensitivity. This review discusses the development and application of low-voltage STEM techniques with single-atom sensitivity, primarily based on recent research presented on an invited talk at the 5th 2D23 SALVE Symposium, including annular dark-field (ADF) imaging, functional imaging and electron energy-loss spectroscopy (EELS) analysis. Carbon-based nanomaterials were chosen as model systems for demonstrating the capabilities of single-atom STEM imaging and EELS analysis, due to their structural stability under low accelerating voltages and their rich physical and chemical properties. Moreover, this review summarizes recent advancements and applications of low-voltage single-atom STEM imaging and spectroscopy in the study of functional materials and discusses prospects for future developments.

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来源期刊
Micron
Micron 工程技术-显微镜技术
CiteScore
4.30
自引率
4.20%
发文量
100
审稿时长
31 days
期刊介绍: Micron is an interdisciplinary forum for all work that involves new applications of microscopy or where advanced microscopy plays a central role. The journal will publish on the design, methods, application, practice or theory of microscopy and microanalysis, including reports on optical, electron-beam, X-ray microtomography, and scanning-probe systems. It also aims at the regular publication of review papers, short communications, as well as thematic issues on contemporary developments in microscopy and microanalysis. The journal embraces original research in which microscopy has contributed significantly to knowledge in biology, life science, nanoscience and nanotechnology, materials science and engineering.
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