利用低能量大电流电子束在 Ni3Al 上形成的 Ni3Al - TiC 表面复合材料的微观结构和性能

IF 3.8 2区 材料科学 Q2 MATERIALS SCIENCE, MULTIDISCIPLINARY Vacuum Pub Date : 2024-09-05 DOI:10.1016/j.vacuum.2024.113606
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引用次数: 0

摘要

我们使用扫描和透射电子显微镜、X 射线衍射、轮廓仪、压痕和摩擦试验,研究了用低能量大电流电子束(LEHCEB)处理的 Ni3Al 金属间化合物和 "Ni3Al 基底-TiC 薄粉涂层 "系统的微观结构、近表面层的相组成、显微硬度、表面粗糙度、抗裂性和耐磨性。我们揭示了在表面能量密度为 8 J/cm2、加速电压为 30 kV、10 脉冲的 LEHCEB 照射下,TiC 粒子在这些材料的不同行为中的关键作用。经过三次堆焊后,近表面中 TiC 的质量分数高达 22 wt %。研究发现,TiC 薄层的存在使表面复合材料近表面层的微观结构和相细化得以实现,并提高了微硬度和耐磨性。与不含 TiC 的 Ni3Al 相比,表面复合材料的表面裂纹密度降低了 1.8,粗糙度保持不变。采用 LEHCEB 工艺加工金属间化合物薄粉末层的优点对可能的实际应用具有吸引力。
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Microstructure and properties of Ni3Al – TiC surface composites formed on Ni3Al using low-energy high-current electron beam

Using scanning and transmission electron microscopy, X-ray diffraction, profilometry, indentation and friction tests we investigated the microstructure and phase composition formation in the near-surface layer, microhardness, surface roughness, resistance to cracking and wear resistance in Ni3Al intermetallic compound and “Ni3Al base – thin powder TiC coating” system processed with low-energy high-current electron beam (LEHCEB). We revealed the crucial role of TiC particles in different behavior of these materials under LEHCEB irradiation with the surface energy density of 8 J/cm2, accelerating voltage of 30 kV and 10 pulses. The mass fraction of TiC in the near-surface was as much as 22 wt % after three times surfacing. It was found that the presence of TiC thin layer enabled essential microstructure and phase refinement in the near-surface layer of the surface composites and improvement in microhardness and wear resistance. The density of surface cracks in the surface composites is 1.8 lower with respect to TiC-free Ni3Al and the roughness keeps the same. The advantages of LEHCEB processing of intermetallic compounds with thin powder layers are attractive for possible practical application.

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来源期刊
Vacuum
Vacuum 工程技术-材料科学:综合
CiteScore
6.80
自引率
17.50%
发文量
0
审稿时长
34 days
期刊介绍: Vacuum is an international rapid publications journal with a focus on short communication. All papers are peer-reviewed, with the review process for short communication geared towards very fast turnaround times. The journal also published full research papers, thematic issues and selected papers from leading conferences. A report in Vacuum should represent a major advance in an area that involves a controlled environment at pressures of one atmosphere or below. The scope of the journal includes: 1. Vacuum; original developments in vacuum pumping and instrumentation, vacuum measurement, vacuum gas dynamics, gas-surface interactions, surface treatment for UHV applications and low outgassing, vacuum melting, sintering, and vacuum metrology. Technology and solutions for large-scale facilities (e.g., particle accelerators and fusion devices). New instrumentation ( e.g., detectors and electron microscopes). 2. Plasma science; advances in PVD, CVD, plasma-assisted CVD, ion sources, deposition processes and analysis. 3. Surface science; surface engineering, surface chemistry, surface analysis, crystal growth, ion-surface interactions and etching, nanometer-scale processing, surface modification. 4. Materials science; novel functional or structural materials. Metals, ceramics, and polymers. Experiments, simulations, and modelling for understanding structure-property relationships. Thin films and coatings. Nanostructures and ion implantation.
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