利用同步辐射透射 X 射线纳米层析技术表征加成法制造的 AlSi10Mg 中的硅颗粒

M Defer, S Dasgupta, A J Shahani, X Xiao, D Juul Jensen, Y Zhang
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引用次数: 0

摘要

在通过激光粉末床熔融技术制造的 AlSi10Mg 样品中,由于 Al 和 Si 之间的吸收对比度较低,通过 X 射线成像将 Si 共晶网络/Si 颗粒与 Al 基体区分开来具有挑战性。这项研究探讨了在同步辐射透射 X 射线显微镜中克服这一障碍的可能性。研究评估了不同散焦条件和 X 射线束能量的影响,并确定了在 520°C 下对退火后印刷 2 小时的样品进行成像的最佳条件。结果表明,无论是大颗粒(如 4 微米)还是小至 0.5 微米的颗粒,都能以合理的精度进行三维无损成像。
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Characterization of Si particles in additively manufactured AlSi10Mg using synchrotron transmission X-ray nanotomography
In AlSi10Mg samples manufactured by Laser Powder Bed Fusion, distinguishing the Si eutectic network/Si particles from the Al matrix by X-ray imaging is challenging due to the low absorption contrast between the Al and Si. This work investigates the possibility of overcoming this obstacle in synchrotron transmission X-ray microscopy. Effects of both different defocusing conditions and X-ray beam energies are evaluated and optimal conditions are identified for imaging a sample annealed post-print for 2h at 520°C. It is shown that both large particles (e.g. 4μm) and particles as small as 0.5 μm, can be imaged with reasonable precision in 3D non-destructively.
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