洞察电子漂移轨迹对硅漂移探测器电荷收集的影响

IF 1.8 4区 材料科学 Q3 MATERIALS SCIENCE, MULTIDISCIPLINARY ECS Journal of Solid State Science and Technology Pub Date : 2024-09-04 DOI:10.1149/2162-8777/ad7401
Rongrong Guo, Yujia Peng, Huixiang Huang, Chih-Ching Chen, Tsung-Yi Chen
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引用次数: 0

摘要

内部电场分布是影响硅漂移探测器(SDD)电荷收集效率的一个关键设计因素。硅漂移探测器前后表面的内部静电势分布由阴极电极的外加电压决定,它定义了最终的内部电场分布。前后偏置耦合导致了电极结构设计和电压调整的复杂性。我们进行了器件仿真,以研究不同偏置电压下 SDD 的性能。当阴极偏压为-40 V,第一环偏压为-15 V,最外环偏压为-80 V时,探测器的偏压电场分布均匀,有利于电子漂移轨迹。模拟结果为了解内部电场和电子漂移轨迹对电荷收集效率的影响提供了新的视角。根据对模拟结果的分析,设计并制造了一个 2000 × 2000 μm 面积的同心硅漂移探测器。对所设计探测器的电气特性进行了研究,以证明所提出的器件设计方法的有效性。通过调整内部电场分布和电子漂移轨迹,可以提高电荷收集效率。
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Insight into the Impact of Electron Drift Trajectory on Charge Collection in Silicon Drift Detector
The internal electric field distribution is one key design consideration, which affects the charge collection efficiency in silicon drift detectors (SDDs). The internal electrostatic potential distributions along SDD front and back surfaces, which are determined by the applied voltages at cathode electrodes, define the final internal field distribution. Front-back bias coupling leads to the complexity of electrode structure design and voltage tuning. Device simulation is performed to investigate the performance of SDDs with varied bias voltages. When the cathode bias is −40 V with the first ring bias of −15 V and the outermost ring bias of −80 V, the detector is biased with a uniform electric field distribution, favorable electron drift trajectories. The simulation results provide new insight into the influence of internal electric field and electron drift trajectories on the charge collection efficiency. According to the analysis of simulation results, a 2000 × 2000 μm area concentric silicon drift detector was designed and fabricated. The electrical characteristics of the designed detectors were studied to show the validity of the proposed device design methodology. The internal electric field distribution and electron drift trajectories can be tuned to improve the charge collection efficiency.
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来源期刊
ECS Journal of Solid State Science and Technology
ECS Journal of Solid State Science and Technology MATERIALS SCIENCE, MULTIDISCIPLINARY-PHYSICS, APPLIED
CiteScore
4.50
自引率
13.60%
发文量
455
期刊介绍: The ECS Journal of Solid State Science and Technology (JSS) was launched in 2012, and publishes outstanding research covering fundamental and applied areas of solid state science and technology, including experimental and theoretical aspects of the chemistry and physics of materials and devices. JSS has five topical interest areas: carbon nanostructures and devices dielectric science and materials electronic materials and processing electronic and photonic devices and systems luminescence and display materials, devices and processing.
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