成型工艺对 (Mg1-xZnx)2SiO4 高频介电陶瓷烧结和性能的影响

IF 2.8 4区 工程技术 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC Journal of Materials Science: Materials in Electronics Pub Date : 2024-09-10 DOI:10.1007/s10854-024-13440-4
Hanbi Zhang, Xiangchun Liu, Kai Zhang, Jiayan Guan, Danni Chen, Miao Zhang, Jiahao Liu, Ziyao Wei, Feng Gao
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摘要

(采用不同的成型方法制备了 (Mg1-xZnx)2SiO4(x = 0.2、0.4、0.6、0.8)陶瓷,研究了不同配比陶瓷的烧结特性和高频介电性能,确定了实验条件下最佳的 Mg/Zn 配比。X 射线衍射(XRD)图显示,当 x < 0.4 时,试样具有 Forsterite 结构,而当 x ≥ 0.4 时,试样具有 Willemite 结构。扫描电镜图像表明,热压(Mg0.4Zn0.6)2 SiO4 陶瓷的致密性优于干压。热压获得的(Mg1-xZnx)2SiO4 陶瓷的体积密度总体上有所增加。(Mg0.4Zn0.6)2SiO4 陶瓷在 1325 ℃ 烧结时具有最佳的高频介电性能,干压和热压的性能参数分别为 εr = 6.74,tanδ = 8.88 × 10-4 和 εr = 6.36,tanδ = 1.35 × 10-3。
本文章由计算机程序翻译,如有差异,请以英文原文为准。

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Effect of molding process on sintering and properties of (Mg1-xZnx)2SiO4 high-frequency dielectric ceramics

(Mg1-xZnx)2SiO4 (x = 0.2, 0.4, 0.6, 0.8) ceramics were prepared by different molding methods, the sintering characteristics and high-frequency dielectric properties of ceramics with different ratios were studied, and the optimum Mg/Zn ratio was determined under the experimental conditions. X-ray diffraction (XRD) patterns show that the specimens have a Forsterite structure when x < 0.4, while when x ≥ 0.4, the specimens have a Willemite structure. SEM images suggested that the density of hot pressing (Mg0.4Zn0.6)2SiO4 ceramics is better than that of dry pressing. The (Mg1-xZnx)2SiO4 ceramics obtained by hot pressing show an overall increase in bulk density. (Mg0.4Zn0.6)2SiO4 ceramics have the best high-frequency dielectric properties when sintered at 1325 °C, and the performance parameters of dry pressing and hot pressing are εr = 6.74, tanδ = 8.88 × 10–4 and εr = 6.36, tanδ = 1.35 × 10–3, respectively.

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来源期刊
Journal of Materials Science: Materials in Electronics
Journal of Materials Science: Materials in Electronics 工程技术-材料科学:综合
CiteScore
5.00
自引率
7.10%
发文量
1931
审稿时长
2 months
期刊介绍: The Journal of Materials Science: Materials in Electronics is an established refereed companion to the Journal of Materials Science. It publishes papers on materials and their applications in modern electronics, covering the ground between fundamental science, such as semiconductor physics, and work concerned specifically with applications. It explores the growth and preparation of new materials, as well as their processing, fabrication, bonding and encapsulation, together with the reliability, failure analysis, quality assurance and characterization related to the whole range of applications in electronics. The Journal presents papers in newly developing fields such as low dimensional structures and devices, optoelectronics including III-V compounds, glasses and linear/non-linear crystal materials and lasers, high Tc superconductors, conducting polymers, thick film materials and new contact technologies, as well as the established electronics device and circuit materials.
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