Andrey Ushakov, Ad Verlaan, Ulf Stephan, Olaff Steinke, Cederik Meekes, André Rijfers, Peter Giesen, Eiichi Yatsuka, Maarten de Bock, Michele Bassan, Lucas Moser, Masahito Yokoyama, Erik van Beekum, Shobhit Yadav
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引用次数: 0
摘要
考虑到在惰性气体中以低压(1-10 帕)运行的射频放电,建议采用新的等离子源来清洁热核实验堆实验诊断仪器中的光学镜。有近二十种光学诊断仪器的前端光学镜可能需要等离子清洗。这些反射镜的尺寸各不相同,需要高达 400 W 的放电功率才能形成能够清除含 Be 和 W 污染物的离子通量,从而在对反射镜造成可容忍损坏的情况下恢复光学性能。建议用于清洁污染物的等离子源包括一个靠近反射镜的真空匹配电路,以及一个四分之一波长的带阻带陷波滤波器(当需要对反射镜进行水冷时)。长期运行的稳定性和清洁的均匀性可以利用驱动频率的变化来调整电路,并利用射频电压的相移来同时清洁两个反射镜。本文针对两个热核实验堆光学仪器:边缘汤姆逊散射和可见光谱参考系统,对基于 40 MHz 射频放电的等离子源进行了实验研究,以清洁第一面反射镜。在诊断端口插头几何原型的实际配置中对频率调整和相移进行了研究。
Plasma sources sputtering nanoscale contaminants with low-energy ion flux on front-end mirrors in ITER optical diagnostics
New plasma sources are proposed to clean optical mirrors in diagnostic instruments of the ITER experiment considering RF discharges operating at low pressures (1–10 Pa) in inert gases. There are nearly twenty optical diagnostics where the front-end optical mirrors may require plasma cleaning. The mirrors vary in size and would need up to 400 W in the discharge to form ion fluxes capable of removing Be- and W-containing contaminants to restore the optical performance with tolerable damage to the mirror. The plasma sources suggested to clean contaminants include a vacuum matching circuit placed close to the mirror and a quarter wavelength band stop notch filter when mirror water cooling is needed. Long-term operation stability and cleaning homogeneity may employ a driving frequency variation to tune the circuit and a phase shift for RF voltages to clean two mirrors simultaneously. In this paper, the plasma sources based on 40 MHz RF discharge to clean first mirrors are studied experimentally for two ITER optical instruments: the Edge Thomson Scattering and the Visible Spectroscopy Reference System. Frequency tuning and phase shifting are studied in realistic configurations prototyping diagnostic port plug geometries.
期刊介绍:
The Japanese Journal of Applied Physics (JJAP) is an international journal for the advancement and dissemination of knowledge in all fields of applied physics. JJAP is a sister journal of the Applied Physics Express (APEX) and is published by IOP Publishing Ltd on behalf of the Japan Society of Applied Physics (JSAP).
JJAP publishes articles that significantly contribute to the advancements in the applications of physical principles as well as in the understanding of physics in view of particular applications in mind. Subjects covered by JJAP include the following fields:
• Semiconductors, dielectrics, and organic materials
• Photonics, quantum electronics, optics, and spectroscopy
• Spintronics, superconductivity, and strongly correlated materials
• Device physics including quantum information processing
• Physics-based circuits and systems
• Nanoscale science and technology
• Crystal growth, surfaces, interfaces, thin films, and bulk materials
• Plasmas, applied atomic and molecular physics, and applied nuclear physics
• Device processing, fabrication and measurement technologies, and instrumentation
• Cross-disciplinary areas such as bioelectronics/photonics, biosensing, environmental/energy technologies, and MEMS