Active illumination mode with checkerboard pattern in focus variation microscopy: Analysis and application

Optical measurement methods for surface topography offer the advantages of high accuracy, rapid measurement, and non-destructiveness. Each method has its own suitable application scenarios. Among them, focus variation microscopy is extensively employed in precision manufacturing, aerospace, and medical industries due to its ability to measure rough and large slopes surfaces. However, since the measurement depends on local grayscale differences between focused and blurred images, it cannot measure surfaces with low reflectivity or insufficient texture information. In this work, we propose an active illumination mode for focus variation method that utilizes a digital micromirror device (DMD) to generate a checkerboard pattern. This method introduces additional texture information, resulting in a usable local gradient of image grayscale. Additionally, we analyze the selection criteria for the checkerboard pattern parameters, including the period and light-dark ratio. Furthermore, measurements of two standard steps with different heights demonstrate that the measurement repeatability of the proposed method can reach the nanometer level, rendering it suitable for high-precision measurements. More importantly, the measurement noise results indicate significantly superior performance of active illumination mode compared to the uniform illumination mode. Finally, we reconstruct the surface topography of the microchannels in a microfluidic chip through the encapsulation layer, demonstrating the feasibility of the proposed method.