原位生长的掺锌石墨烯基薄膜的纳米结构和自清洁性能的 TEM 和 DFT 计算

IF 3.8 2区 材料科学 Q2 MATERIALS SCIENCE, MULTIDISCIPLINARY Vacuum Pub Date : 2024-09-14 DOI:10.1016/j.vacuum.2024.113653
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引用次数: 0

摘要

通过 PECVD 在粗纱织物上原位生长了石墨烯、g-C3N4/石墨烯(NG)、CF2 改性 g-C3N4/ 石墨烯(FNG)薄膜。通过高分辨率 TEM 揭示了纳米结构,评估了在 Zn(NO3)2 溶液中的自清洁性能,并通过 DFT 计算建立了相互作用模型。结果表明,NG@Zn-NPs 膜呈现出紧密结合的锌纳米颗粒,与 NG 堆叠在一起;而 FNG@Zn-NPs 膜富含 F 原子,缓解了堆叠结构,提高了 Zn-NPs 与 FNG 表面的结合力。重金属离子可通过 NG@Zn-NPs 和 FNG@Zn-NPs 薄膜有效析出。此外,FNG@Zn-NPs 膜的超疏水性因 CF2 功能基团周围的电荷密度而增强,从而进一步提高了自清洁性能。
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TEM and DFT calculation on the nanostructure and self-cleaning performance of in-situ grown Zn-doped graphene-based films

Graphene, g-C3N4/graphene (NG), CF2-modified g-C3N4/graphene (FNG) films were in situ grown on roving fabric via PECVD, in which Zinc nanoparticles (Zn-NPs) acted as an enhancer integrated by a following chemical method. The nanostructures were revealed by high-resolution TEM, the self-cleaning performance in Zn(NO3)2 solution was evaluated, and the interaction model was established with DFT calculation. Results show that the NG@Zn-NPs film presents tightly bound zinc nanoparticles, which are stacked with the NG; whereas the FNG@Zn-NPs film is enriched with the F atoms, which alleviate stacking structure and improves bonding force of Zn-NPs with the FNG surface. The heavy metal ions are efficiently precipitated through the NG@Zn-NPs and FNG@Zn-NPs films. Moreover, the superhydrophobicity of FNG@Zn-NPs film is enhanced by the charge density around the CF2 functional groups, which further improves self-cleaning performance.

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来源期刊
Vacuum
Vacuum 工程技术-材料科学:综合
CiteScore
6.80
自引率
17.50%
发文量
0
审稿时长
34 days
期刊介绍: Vacuum is an international rapid publications journal with a focus on short communication. All papers are peer-reviewed, with the review process for short communication geared towards very fast turnaround times. The journal also published full research papers, thematic issues and selected papers from leading conferences. A report in Vacuum should represent a major advance in an area that involves a controlled environment at pressures of one atmosphere or below. The scope of the journal includes: 1. Vacuum; original developments in vacuum pumping and instrumentation, vacuum measurement, vacuum gas dynamics, gas-surface interactions, surface treatment for UHV applications and low outgassing, vacuum melting, sintering, and vacuum metrology. Technology and solutions for large-scale facilities (e.g., particle accelerators and fusion devices). New instrumentation ( e.g., detectors and electron microscopes). 2. Plasma science; advances in PVD, CVD, plasma-assisted CVD, ion sources, deposition processes and analysis. 3. Surface science; surface engineering, surface chemistry, surface analysis, crystal growth, ion-surface interactions and etching, nanometer-scale processing, surface modification. 4. Materials science; novel functional or structural materials. Metals, ceramics, and polymers. Experiments, simulations, and modelling for understanding structure-property relationships. Thin films and coatings. Nanostructures and ion implantation.
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