{"title":"新型 ZnO/FeOCl 复合材料作为光 Fenton 催化剂在可见光下降解四环素","authors":"Qingsong Yu, Zhiming Li, Zhiqiang Wei, Meijie Ding, Huining Zhang","doi":"10.1007/s10854-024-13497-1","DOIUrl":null,"url":null,"abstract":"<p>A series of novel ZnO/FeOCl photo-Fenton catalysts were prepared using a simple calcination method. These composite catalysts were evaluated for tetracycline (TC) degradation under simulated sunlight. The photo-Fenton tests revealed that the ZnO/FeOCl composite catalysts exhibited higher activity than pure FeOCl due to the presence of ZnO. Specifically, the degradation of TC by 20% ZnO/FeOCl reached 93.9% in 60 min, which was attributed to the formation of an n–n heterojunction between ZnO and FeOCl that enhanced the separation efficiency of photogenerated electron–hole pairs. Additionally, the TC removal efficiency remained at 84.4% after four cycles, indicating good structural stability of the composite catalyst. A proposed mechanism for TC degradation by ZnO/FeOCl catalysts, based on free radical trapping experiments, suggested that hydroxyl radicals (·OH) were the primary active species. This study provides new insights into the synthesis of photo-Fenton catalysts and the efficient treatment of antibiotic-contaminated wastewater.</p>","PeriodicalId":646,"journal":{"name":"Journal of Materials Science: Materials in Electronics","volume":null,"pages":null},"PeriodicalIF":2.8000,"publicationDate":"2024-09-18","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"A novel ZnO/FeOCl composite as a photo-Fenton catalyst for degradation tetracycline under visible light\",\"authors\":\"Qingsong Yu, Zhiming Li, Zhiqiang Wei, Meijie Ding, Huining Zhang\",\"doi\":\"10.1007/s10854-024-13497-1\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"<p>A series of novel ZnO/FeOCl photo-Fenton catalysts were prepared using a simple calcination method. These composite catalysts were evaluated for tetracycline (TC) degradation under simulated sunlight. The photo-Fenton tests revealed that the ZnO/FeOCl composite catalysts exhibited higher activity than pure FeOCl due to the presence of ZnO. Specifically, the degradation of TC by 20% ZnO/FeOCl reached 93.9% in 60 min, which was attributed to the formation of an n–n heterojunction between ZnO and FeOCl that enhanced the separation efficiency of photogenerated electron–hole pairs. Additionally, the TC removal efficiency remained at 84.4% after four cycles, indicating good structural stability of the composite catalyst. A proposed mechanism for TC degradation by ZnO/FeOCl catalysts, based on free radical trapping experiments, suggested that hydroxyl radicals (·OH) were the primary active species. This study provides new insights into the synthesis of photo-Fenton catalysts and the efficient treatment of antibiotic-contaminated wastewater.</p>\",\"PeriodicalId\":646,\"journal\":{\"name\":\"Journal of Materials Science: Materials in Electronics\",\"volume\":null,\"pages\":null},\"PeriodicalIF\":2.8000,\"publicationDate\":\"2024-09-18\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Journal of Materials Science: Materials in Electronics\",\"FirstCategoryId\":\"5\",\"ListUrlMain\":\"https://doi.org/10.1007/s10854-024-13497-1\",\"RegionNum\":4,\"RegionCategory\":\"工程技术\",\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q2\",\"JCRName\":\"ENGINEERING, ELECTRICAL & ELECTRONIC\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Journal of Materials Science: Materials in Electronics","FirstCategoryId":"5","ListUrlMain":"https://doi.org/10.1007/s10854-024-13497-1","RegionNum":4,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q2","JCRName":"ENGINEERING, ELECTRICAL & ELECTRONIC","Score":null,"Total":0}
A novel ZnO/FeOCl composite as a photo-Fenton catalyst for degradation tetracycline under visible light
A series of novel ZnO/FeOCl photo-Fenton catalysts were prepared using a simple calcination method. These composite catalysts were evaluated for tetracycline (TC) degradation under simulated sunlight. The photo-Fenton tests revealed that the ZnO/FeOCl composite catalysts exhibited higher activity than pure FeOCl due to the presence of ZnO. Specifically, the degradation of TC by 20% ZnO/FeOCl reached 93.9% in 60 min, which was attributed to the formation of an n–n heterojunction between ZnO and FeOCl that enhanced the separation efficiency of photogenerated electron–hole pairs. Additionally, the TC removal efficiency remained at 84.4% after four cycles, indicating good structural stability of the composite catalyst. A proposed mechanism for TC degradation by ZnO/FeOCl catalysts, based on free radical trapping experiments, suggested that hydroxyl radicals (·OH) were the primary active species. This study provides new insights into the synthesis of photo-Fenton catalysts and the efficient treatment of antibiotic-contaminated wastewater.
期刊介绍:
The Journal of Materials Science: Materials in Electronics is an established refereed companion to the Journal of Materials Science. It publishes papers on materials and their applications in modern electronics, covering the ground between fundamental science, such as semiconductor physics, and work concerned specifically with applications. It explores the growth and preparation of new materials, as well as their processing, fabrication, bonding and encapsulation, together with the reliability, failure analysis, quality assurance and characterization related to the whole range of applications in electronics. The Journal presents papers in newly developing fields such as low dimensional structures and devices, optoelectronics including III-V compounds, glasses and linear/non-linear crystal materials and lasers, high Tc superconductors, conducting polymers, thick film materials and new contact technologies, as well as the established electronics device and circuit materials.