{"title":"利用气相沉积技术研究硼靶制备过程中的喷溅效应","authors":"","doi":"10.1016/j.vacuum.2024.113642","DOIUrl":null,"url":null,"abstract":"<div><div>Self-supported and carbon/aluminum-backed isotopically enriched thin boron targets were prepared by the vapour deposition technique using electron beam. To mitigate spitting effects observed during this process, boron powder was evaporated in both paste and pellet forms. Effective reduction of spitting was achieved by initially heating boron at low currents followed by its step-wise increase. Analysis of boron samples at various stages of evaporation was done by X-ray Diffraction (XRD) and Fourier-transform Infrared spectroscopy (FTIR). Direct exposure to high-energy electron beams contributed to a decrease in boron oxide and hydride compounds, thereby aiding in minimizing spitting. However, upon exposure to air, the evaporated film underwent surface oxidation, confirmed by Transmission Electron Microscopy (TEM), Energy Dispersive X-ray spectroscopy (EDX) and X-ray Photoelectron Spectroscopy (XPS) measurements. Further investigations into the longevity of the film (target) were conducted using optical microscopy and FTIR spectroscopy. These analyses revealed hydrogenation and oxidation of the film upon exposure to atmosphere, resulting in increased fragility and noticeable colour changes over time.</div></div>","PeriodicalId":23559,"journal":{"name":"Vacuum","volume":null,"pages":null},"PeriodicalIF":3.8000,"publicationDate":"2024-09-14","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Investigation of spitting effect in the boron target preparation using vapour deposition technique\",\"authors\":\"\",\"doi\":\"10.1016/j.vacuum.2024.113642\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"<div><div>Self-supported and carbon/aluminum-backed isotopically enriched thin boron targets were prepared by the vapour deposition technique using electron beam. To mitigate spitting effects observed during this process, boron powder was evaporated in both paste and pellet forms. Effective reduction of spitting was achieved by initially heating boron at low currents followed by its step-wise increase. Analysis of boron samples at various stages of evaporation was done by X-ray Diffraction (XRD) and Fourier-transform Infrared spectroscopy (FTIR). Direct exposure to high-energy electron beams contributed to a decrease in boron oxide and hydride compounds, thereby aiding in minimizing spitting. However, upon exposure to air, the evaporated film underwent surface oxidation, confirmed by Transmission Electron Microscopy (TEM), Energy Dispersive X-ray spectroscopy (EDX) and X-ray Photoelectron Spectroscopy (XPS) measurements. Further investigations into the longevity of the film (target) were conducted using optical microscopy and FTIR spectroscopy. These analyses revealed hydrogenation and oxidation of the film upon exposure to atmosphere, resulting in increased fragility and noticeable colour changes over time.</div></div>\",\"PeriodicalId\":23559,\"journal\":{\"name\":\"Vacuum\",\"volume\":null,\"pages\":null},\"PeriodicalIF\":3.8000,\"publicationDate\":\"2024-09-14\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Vacuum\",\"FirstCategoryId\":\"88\",\"ListUrlMain\":\"https://www.sciencedirect.com/science/article/pii/S0042207X24006882\",\"RegionNum\":2,\"RegionCategory\":\"材料科学\",\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q2\",\"JCRName\":\"MATERIALS SCIENCE, MULTIDISCIPLINARY\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Vacuum","FirstCategoryId":"88","ListUrlMain":"https://www.sciencedirect.com/science/article/pii/S0042207X24006882","RegionNum":2,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q2","JCRName":"MATERIALS SCIENCE, MULTIDISCIPLINARY","Score":null,"Total":0}
引用次数: 0
摘要
利用电子束气相沉积技术制备了自支撑和碳/铝支撑的同位素富集硼薄靶。为了减轻在此过程中观察到的喷溅效应,硼粉以浆料和颗粒两种形式蒸发。最初以低电流加热硼,然后逐步提高电流,可以有效减少溅射。通过 X 射线衍射(XRD)和傅立叶变换红外光谱(FTIR)对不同蒸发阶段的硼样品进行了分析。直接暴露于高能电子束有助于减少氧化硼和氢化物,从而最大限度地减少喷溅。然而,在暴露于空气中时,蒸发薄膜会发生表面氧化,透射电子显微镜 (TEM)、能量色散 X 射线光谱 (EDX) 和 X 射线光电子能谱 (XPS) 测量证实了这一点。使用光学显微镜和傅立叶变换红外光谱对薄膜(目标)的寿命进行了进一步研究。这些分析表明,薄膜在暴露于大气时会发生氢化和氧化,从而导致脆性增加,并随着时间的推移发生明显的颜色变化。
Investigation of spitting effect in the boron target preparation using vapour deposition technique
Self-supported and carbon/aluminum-backed isotopically enriched thin boron targets were prepared by the vapour deposition technique using electron beam. To mitigate spitting effects observed during this process, boron powder was evaporated in both paste and pellet forms. Effective reduction of spitting was achieved by initially heating boron at low currents followed by its step-wise increase. Analysis of boron samples at various stages of evaporation was done by X-ray Diffraction (XRD) and Fourier-transform Infrared spectroscopy (FTIR). Direct exposure to high-energy electron beams contributed to a decrease in boron oxide and hydride compounds, thereby aiding in minimizing spitting. However, upon exposure to air, the evaporated film underwent surface oxidation, confirmed by Transmission Electron Microscopy (TEM), Energy Dispersive X-ray spectroscopy (EDX) and X-ray Photoelectron Spectroscopy (XPS) measurements. Further investigations into the longevity of the film (target) were conducted using optical microscopy and FTIR spectroscopy. These analyses revealed hydrogenation and oxidation of the film upon exposure to atmosphere, resulting in increased fragility and noticeable colour changes over time.
期刊介绍:
Vacuum is an international rapid publications journal with a focus on short communication. All papers are peer-reviewed, with the review process for short communication geared towards very fast turnaround times. The journal also published full research papers, thematic issues and selected papers from leading conferences.
A report in Vacuum should represent a major advance in an area that involves a controlled environment at pressures of one atmosphere or below.
The scope of the journal includes:
1. Vacuum; original developments in vacuum pumping and instrumentation, vacuum measurement, vacuum gas dynamics, gas-surface interactions, surface treatment for UHV applications and low outgassing, vacuum melting, sintering, and vacuum metrology. Technology and solutions for large-scale facilities (e.g., particle accelerators and fusion devices). New instrumentation ( e.g., detectors and electron microscopes).
2. Plasma science; advances in PVD, CVD, plasma-assisted CVD, ion sources, deposition processes and analysis.
3. Surface science; surface engineering, surface chemistry, surface analysis, crystal growth, ion-surface interactions and etching, nanometer-scale processing, surface modification.
4. Materials science; novel functional or structural materials. Metals, ceramics, and polymers. Experiments, simulations, and modelling for understanding structure-property relationships. Thin films and coatings. Nanostructures and ion implantation.