{"title":"短脉冲 HiPIMS 放电中电子温度和密度的动态变化","authors":"","doi":"10.1016/j.vacuum.2024.113672","DOIUrl":null,"url":null,"abstract":"<div><div>This work studies the change in electron density and temperature in short-pulse high power impulse magnetron sputtering (HiPIMS) discharge. A planar magnetron with a copper target of 100 mm in diameter was used in the experiments. Plasma measurements were made using a Langmuir probe placed 85 mm from the target. The discharge current pulse durations were 8, 15, and 100 μs, with a fixed amplitude of 100 A and an average discharge power of 1 kW. To maintain the average discharge power at a constant level, a decrease in the pulse duration was accompanied by an increase in the frequency. When the discharge current pulses started, the electron temperature exceeded 10 eV and then decreased to a few eV. The main time of plasma existence in short-pulse HiPIMS is the afterglow phase, during which the electron density reaches a maximum of 1.9–3.2 × 10<sup>12</sup> cm<sup>−3</sup> and the electron temperature is less than 1 eV. Because the duration of the afterglow phase in short-pulse HiPIMS is longer than the duration of the discharge current pulse, the average integral electron temperature is lower than that in DC and middle-frequency magnetron sputtering. The average integral electron temperature in HiPIMS decreases with decreasing pulse duration.</div></div>","PeriodicalId":23559,"journal":{"name":"Vacuum","volume":null,"pages":null},"PeriodicalIF":3.8000,"publicationDate":"2024-09-20","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"The dynamics of the electron temperature and density in short-pulse HiPIMS discharge\",\"authors\":\"\",\"doi\":\"10.1016/j.vacuum.2024.113672\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"<div><div>This work studies the change in electron density and temperature in short-pulse high power impulse magnetron sputtering (HiPIMS) discharge. A planar magnetron with a copper target of 100 mm in diameter was used in the experiments. Plasma measurements were made using a Langmuir probe placed 85 mm from the target. The discharge current pulse durations were 8, 15, and 100 μs, with a fixed amplitude of 100 A and an average discharge power of 1 kW. To maintain the average discharge power at a constant level, a decrease in the pulse duration was accompanied by an increase in the frequency. When the discharge current pulses started, the electron temperature exceeded 10 eV and then decreased to a few eV. The main time of plasma existence in short-pulse HiPIMS is the afterglow phase, during which the electron density reaches a maximum of 1.9–3.2 × 10<sup>12</sup> cm<sup>−3</sup> and the electron temperature is less than 1 eV. Because the duration of the afterglow phase in short-pulse HiPIMS is longer than the duration of the discharge current pulse, the average integral electron temperature is lower than that in DC and middle-frequency magnetron sputtering. The average integral electron temperature in HiPIMS decreases with decreasing pulse duration.</div></div>\",\"PeriodicalId\":23559,\"journal\":{\"name\":\"Vacuum\",\"volume\":null,\"pages\":null},\"PeriodicalIF\":3.8000,\"publicationDate\":\"2024-09-20\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Vacuum\",\"FirstCategoryId\":\"88\",\"ListUrlMain\":\"https://www.sciencedirect.com/science/article/pii/S0042207X24007188\",\"RegionNum\":2,\"RegionCategory\":\"材料科学\",\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q2\",\"JCRName\":\"MATERIALS SCIENCE, MULTIDISCIPLINARY\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Vacuum","FirstCategoryId":"88","ListUrlMain":"https://www.sciencedirect.com/science/article/pii/S0042207X24007188","RegionNum":2,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q2","JCRName":"MATERIALS SCIENCE, MULTIDISCIPLINARY","Score":null,"Total":0}
The dynamics of the electron temperature and density in short-pulse HiPIMS discharge
This work studies the change in electron density and temperature in short-pulse high power impulse magnetron sputtering (HiPIMS) discharge. A planar magnetron with a copper target of 100 mm in diameter was used in the experiments. Plasma measurements were made using a Langmuir probe placed 85 mm from the target. The discharge current pulse durations were 8, 15, and 100 μs, with a fixed amplitude of 100 A and an average discharge power of 1 kW. To maintain the average discharge power at a constant level, a decrease in the pulse duration was accompanied by an increase in the frequency. When the discharge current pulses started, the electron temperature exceeded 10 eV and then decreased to a few eV. The main time of plasma existence in short-pulse HiPIMS is the afterglow phase, during which the electron density reaches a maximum of 1.9–3.2 × 1012 cm−3 and the electron temperature is less than 1 eV. Because the duration of the afterglow phase in short-pulse HiPIMS is longer than the duration of the discharge current pulse, the average integral electron temperature is lower than that in DC and middle-frequency magnetron sputtering. The average integral electron temperature in HiPIMS decreases with decreasing pulse duration.
期刊介绍:
Vacuum is an international rapid publications journal with a focus on short communication. All papers are peer-reviewed, with the review process for short communication geared towards very fast turnaround times. The journal also published full research papers, thematic issues and selected papers from leading conferences.
A report in Vacuum should represent a major advance in an area that involves a controlled environment at pressures of one atmosphere or below.
The scope of the journal includes:
1. Vacuum; original developments in vacuum pumping and instrumentation, vacuum measurement, vacuum gas dynamics, gas-surface interactions, surface treatment for UHV applications and low outgassing, vacuum melting, sintering, and vacuum metrology. Technology and solutions for large-scale facilities (e.g., particle accelerators and fusion devices). New instrumentation ( e.g., detectors and electron microscopes).
2. Plasma science; advances in PVD, CVD, plasma-assisted CVD, ion sources, deposition processes and analysis.
3. Surface science; surface engineering, surface chemistry, surface analysis, crystal growth, ion-surface interactions and etching, nanometer-scale processing, surface modification.
4. Materials science; novel functional or structural materials. Metals, ceramics, and polymers. Experiments, simulations, and modelling for understanding structure-property relationships. Thin films and coatings. Nanostructures and ion implantation.