{"title":"多芬-肖特基势垒 FinFET 的温度变化:模拟/射频线性度研究","authors":"V Shalini, Prashanth Kumar","doi":"10.1002/adts.202400531","DOIUrl":null,"url":null,"abstract":"In this script, a Gallium Nitride (GaN)-based FinFET structure is proposed with a multi-channel device that is designed and simulated. Here, the 3D-Sentaures TCAD simulator is used to investigate the analog/radio frequency performance and linearity of the MultiFin-Schottky Barrier FinFET with different temperatures of 100–400 K. The proposed device underwent a temperature analysis, where critical parameters include drain current, I<sub>ON</sub>/I<sub>OFF</sub> ratio, Transconductance (g<sub>m</sub>), higher-order terms (g<sub>m2</sub> and g<sub>m3</sub>), Gain Bandwidth Product (GBP), Cut-off Frequency (f<sub>T</sub>), Transit Time (τ), Transconductance Generation Factor (TGF), Transconductance Frequency Product (TFP), Voltage Input Intercept Point (VIP<sub>2</sub>, VIP<sub>3</sub>), Input Intercept Point (IIP<sub>3</sub>), and Third Order Intermodulation Distortion (IMD<sub>3</sub>) is thoroughly examined. Thus, the proposed GaN-based FinFET validates as a strong potential contender for GaN-based analog/RF applications.","PeriodicalId":7219,"journal":{"name":"Advanced Theory and Simulations","volume":"15 1","pages":""},"PeriodicalIF":2.9000,"publicationDate":"2024-10-10","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Temperature-Induced Changes in Multifin-Schottky Barrier FinFETs: An Analog/RF Linearity Investigation\",\"authors\":\"V Shalini, Prashanth Kumar\",\"doi\":\"10.1002/adts.202400531\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"In this script, a Gallium Nitride (GaN)-based FinFET structure is proposed with a multi-channel device that is designed and simulated. Here, the 3D-Sentaures TCAD simulator is used to investigate the analog/radio frequency performance and linearity of the MultiFin-Schottky Barrier FinFET with different temperatures of 100–400 K. The proposed device underwent a temperature analysis, where critical parameters include drain current, I<sub>ON</sub>/I<sub>OFF</sub> ratio, Transconductance (g<sub>m</sub>), higher-order terms (g<sub>m2</sub> and g<sub>m3</sub>), Gain Bandwidth Product (GBP), Cut-off Frequency (f<sub>T</sub>), Transit Time (τ), Transconductance Generation Factor (TGF), Transconductance Frequency Product (TFP), Voltage Input Intercept Point (VIP<sub>2</sub>, VIP<sub>3</sub>), Input Intercept Point (IIP<sub>3</sub>), and Third Order Intermodulation Distortion (IMD<sub>3</sub>) is thoroughly examined. Thus, the proposed GaN-based FinFET validates as a strong potential contender for GaN-based analog/RF applications.\",\"PeriodicalId\":7219,\"journal\":{\"name\":\"Advanced Theory and Simulations\",\"volume\":\"15 1\",\"pages\":\"\"},\"PeriodicalIF\":2.9000,\"publicationDate\":\"2024-10-10\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Advanced Theory and Simulations\",\"FirstCategoryId\":\"5\",\"ListUrlMain\":\"https://doi.org/10.1002/adts.202400531\",\"RegionNum\":4,\"RegionCategory\":\"工程技术\",\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q1\",\"JCRName\":\"MULTIDISCIPLINARY SCIENCES\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Advanced Theory and Simulations","FirstCategoryId":"5","ListUrlMain":"https://doi.org/10.1002/adts.202400531","RegionNum":4,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q1","JCRName":"MULTIDISCIPLINARY SCIENCES","Score":null,"Total":0}
Temperature-Induced Changes in Multifin-Schottky Barrier FinFETs: An Analog/RF Linearity Investigation
In this script, a Gallium Nitride (GaN)-based FinFET structure is proposed with a multi-channel device that is designed and simulated. Here, the 3D-Sentaures TCAD simulator is used to investigate the analog/radio frequency performance and linearity of the MultiFin-Schottky Barrier FinFET with different temperatures of 100–400 K. The proposed device underwent a temperature analysis, where critical parameters include drain current, ION/IOFF ratio, Transconductance (gm), higher-order terms (gm2 and gm3), Gain Bandwidth Product (GBP), Cut-off Frequency (fT), Transit Time (τ), Transconductance Generation Factor (TGF), Transconductance Frequency Product (TFP), Voltage Input Intercept Point (VIP2, VIP3), Input Intercept Point (IIP3), and Third Order Intermodulation Distortion (IMD3) is thoroughly examined. Thus, the proposed GaN-based FinFET validates as a strong potential contender for GaN-based analog/RF applications.
期刊介绍:
Advanced Theory and Simulations is an interdisciplinary, international, English-language journal that publishes high-quality scientific results focusing on the development and application of theoretical methods, modeling and simulation approaches in all natural science and medicine areas, including:
materials, chemistry, condensed matter physics
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life science, biology, medicine
atmospheric/environmental science, climate science
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method development, numerical methods, statistics