通过等离子体处理 MIS 型二维异质结构中的光学活性缺陷工程(Adv.)

IF 4.3 3区 材料科学 Q2 CHEMISTRY, MULTIDISCIPLINARY Advanced Materials Interfaces Pub Date : 2024-10-14 DOI:10.1002/admi.202470072
Yingjie Tao, Ran Tian, Jiayuan Zhou, Kui Chu, Xuegang Chen, Wenshuai Gao, Guopeng Wang, Yuxuan Jiang, Kenji Watanabe, Takashi Taniguchi, Mingliang Tian, Xue Liu
{"title":"通过等离子体处理 MIS 型二维异质结构中的光学活性缺陷工程(Adv.)","authors":"Yingjie Tao,&nbsp;Ran Tian,&nbsp;Jiayuan Zhou,&nbsp;Kui Chu,&nbsp;Xuegang Chen,&nbsp;Wenshuai Gao,&nbsp;Guopeng Wang,&nbsp;Yuxuan Jiang,&nbsp;Kenji Watanabe,&nbsp;Takashi Taniguchi,&nbsp;Mingliang Tian,&nbsp;Xue Liu","doi":"10.1002/admi.202470072","DOIUrl":null,"url":null,"abstract":"<p><b>Defect Engineering</b></p><p>Thanks to the existence of photo-active defect states in h-BN, an effective type-II band alignment between h-BN and WS<sub>2</sub> monolayer is formed under 520 laser irradiations. In article 2400288 by Xue Liu and co-workers, such lattice defects were intentionally introduced in the h-BN layer by controlled inductively coupled plasma (ICP) treatment, which provide more driving force for the separation of electron-hole pairs in WS<sub>2</sub> under laser irradiation, and promote the motion of charge carriers at the WS<sub>2</sub>/ h-BN interface.\n\n <figure>\n <div><picture>\n <source></source></picture><p></p>\n </div>\n </figure></p>","PeriodicalId":115,"journal":{"name":"Advanced Materials Interfaces","volume":null,"pages":null},"PeriodicalIF":4.3000,"publicationDate":"2024-10-14","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://onlinelibrary.wiley.com/doi/epdf/10.1002/admi.202470072","citationCount":"0","resultStr":"{\"title\":\"Optically Active Defect Engineering via Plasma Treatment in a MIS-Type 2D Heterostructure (Adv. Mater. Interfaces 29/2024)\",\"authors\":\"Yingjie Tao,&nbsp;Ran Tian,&nbsp;Jiayuan Zhou,&nbsp;Kui Chu,&nbsp;Xuegang Chen,&nbsp;Wenshuai Gao,&nbsp;Guopeng Wang,&nbsp;Yuxuan Jiang,&nbsp;Kenji Watanabe,&nbsp;Takashi Taniguchi,&nbsp;Mingliang Tian,&nbsp;Xue Liu\",\"doi\":\"10.1002/admi.202470072\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"<p><b>Defect Engineering</b></p><p>Thanks to the existence of photo-active defect states in h-BN, an effective type-II band alignment between h-BN and WS<sub>2</sub> monolayer is formed under 520 laser irradiations. In article 2400288 by Xue Liu and co-workers, such lattice defects were intentionally introduced in the h-BN layer by controlled inductively coupled plasma (ICP) treatment, which provide more driving force for the separation of electron-hole pairs in WS<sub>2</sub> under laser irradiation, and promote the motion of charge carriers at the WS<sub>2</sub>/ h-BN interface.\\n\\n <figure>\\n <div><picture>\\n <source></source></picture><p></p>\\n </div>\\n </figure></p>\",\"PeriodicalId\":115,\"journal\":{\"name\":\"Advanced Materials Interfaces\",\"volume\":null,\"pages\":null},\"PeriodicalIF\":4.3000,\"publicationDate\":\"2024-10-14\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"https://onlinelibrary.wiley.com/doi/epdf/10.1002/admi.202470072\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Advanced Materials Interfaces\",\"FirstCategoryId\":\"88\",\"ListUrlMain\":\"https://onlinelibrary.wiley.com/doi/10.1002/admi.202470072\",\"RegionNum\":3,\"RegionCategory\":\"材料科学\",\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q2\",\"JCRName\":\"CHEMISTRY, MULTIDISCIPLINARY\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Advanced Materials Interfaces","FirstCategoryId":"88","ListUrlMain":"https://onlinelibrary.wiley.com/doi/10.1002/admi.202470072","RegionNum":3,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q2","JCRName":"CHEMISTRY, MULTIDISCIPLINARY","Score":null,"Total":0}
引用次数: 0

摘要

缺陷工程由于 h-BN 中存在光活性缺陷态,因此在 520 激光辐照下,h-BN 和 WS2 单层之间会形成有效的 II 型带排列。在刘学及其合作者发表的文章 2400288 中,通过控制电感耦合等离子体(ICP)处理,有意在 h-BN 层中引入了这种晶格缺陷,从而在激光照射下为 WS2 中电子-空穴对的分离提供了更大的驱动力,并促进了电荷载流子在 WS2/ h-BN 界面的运动。
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Optically Active Defect Engineering via Plasma Treatment in a MIS-Type 2D Heterostructure (Adv. Mater. Interfaces 29/2024)

Defect Engineering

Thanks to the existence of photo-active defect states in h-BN, an effective type-II band alignment between h-BN and WS2 monolayer is formed under 520 laser irradiations. In article 2400288 by Xue Liu and co-workers, such lattice defects were intentionally introduced in the h-BN layer by controlled inductively coupled plasma (ICP) treatment, which provide more driving force for the separation of electron-hole pairs in WS2 under laser irradiation, and promote the motion of charge carriers at the WS2/ h-BN interface.

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来源期刊
Advanced Materials Interfaces
Advanced Materials Interfaces CHEMISTRY, MULTIDISCIPLINARY-MATERIALS SCIENCE, MULTIDISCIPLINARY
CiteScore
8.40
自引率
5.60%
发文量
1174
审稿时长
1.3 months
期刊介绍: Advanced Materials Interfaces publishes top-level research on interface technologies and effects. Considering any interface formed between solids, liquids, and gases, the journal ensures an interdisciplinary blend of physics, chemistry, materials science, and life sciences. Advanced Materials Interfaces was launched in 2014 and received an Impact Factor of 4.834 in 2018. The scope of Advanced Materials Interfaces is dedicated to interfaces and surfaces that play an essential role in virtually all materials and devices. Physics, chemistry, materials science and life sciences blend to encourage new, cross-pollinating ideas, which will drive forward our understanding of the processes at the interface. Advanced Materials Interfaces covers all topics in interface-related research: Oil / water separation, Applications of nanostructured materials, 2D materials and heterostructures, Surfaces and interfaces in organic electronic devices, Catalysis and membranes, Self-assembly and nanopatterned surfaces, Composite and coating materials, Biointerfaces for technical and medical applications. Advanced Materials Interfaces provides a forum for topics on surface and interface science with a wide choice of formats: Reviews, Full Papers, and Communications, as well as Progress Reports and Research News.
期刊最新文献
Toward Full-Color Vision Restoration: Conjugated Polymers as Key Functional Materials in Artificial Retinal Prosthetics (Adv. Mater. Interfaces 29/2024) Optically Active Defect Engineering via Plasma Treatment in a MIS-Type 2D Heterostructure (Adv. Mater. Interfaces 29/2024) Masthead: (Adv. Mater. Interfaces 29/2024) CoFe2O4@N-CNH as Bifunctional Hybrid Catalysts for Rechargeable Zinc-Air Batteries (Adv. Mater. Interfaces 28/2024) Masthead: (Adv. Mater. Interfaces 28/2024)
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