{"title":"铁电 Hf₀.₅Zr₀.₅O₂中用于晶粒工程的金属层间插入技术","authors":"Anh-Duy Nguyen;Si-Un Song;An Hoang Thuy Nguyen;Cuong-Manh Nguyen;Ye-Eun Hong;Yeongshin Ham;Jae-Kyeong Kim;Jong-Hwa Baek;Kyungsoo Hwang;Geon Park;Hyun Soo Kim;Hoyeon Sin;Rino Choi","doi":"10.1109/TED.2024.3447614","DOIUrl":null,"url":null,"abstract":"Since its discovery in the previous decade, ferroelectricity (FE) in zirconium-doped hafnium oxide (HZO) has been studied intensively. With HZO being incorporated in multiple applications, grain size reduction has become essential to enhance the ferroelectric performance and scalability. A common method is implementing a dielectric interlayer (IL) in the middle of HZO films while sacrificing operating power caused by voltage drop across the additional material. This research implemented W and Mo metal ILs in the middle of the HZO stack to prevent grain growth. The effects of the ILs on ferroelectric performance were studied using metal-ferroelectric–insulator-silicon structure. Transmission electron microscopy (TEM) and grazing-incidence X-ray diffraction were used to examine the grain formation in HZO. The results show that metal ILs have successfully improved the ferroelectric performance by suppressing the nonferroelectric monoclinic phase while promoting the formation of the orthorhombic phase. The sample with W IL acting as electrodes for both upper and under HZO thin films was more resilient to fatigue than that with the Mo IL. Hence, W metal ILs can enable HZO implementation in a wider range of application.","PeriodicalId":13092,"journal":{"name":"IEEE Transactions on Electron Devices","volume":"71 11","pages":"6647-6651"},"PeriodicalIF":2.9000,"publicationDate":"2024-09-24","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Metal Interlayer Insertion for Grain Engineering in Ferroelectric Hf₀.₅Zr₀.₅O₂\",\"authors\":\"Anh-Duy Nguyen;Si-Un Song;An Hoang Thuy Nguyen;Cuong-Manh Nguyen;Ye-Eun Hong;Yeongshin Ham;Jae-Kyeong Kim;Jong-Hwa Baek;Kyungsoo Hwang;Geon Park;Hyun Soo Kim;Hoyeon Sin;Rino Choi\",\"doi\":\"10.1109/TED.2024.3447614\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Since its discovery in the previous decade, ferroelectricity (FE) in zirconium-doped hafnium oxide (HZO) has been studied intensively. With HZO being incorporated in multiple applications, grain size reduction has become essential to enhance the ferroelectric performance and scalability. A common method is implementing a dielectric interlayer (IL) in the middle of HZO films while sacrificing operating power caused by voltage drop across the additional material. This research implemented W and Mo metal ILs in the middle of the HZO stack to prevent grain growth. The effects of the ILs on ferroelectric performance were studied using metal-ferroelectric–insulator-silicon structure. Transmission electron microscopy (TEM) and grazing-incidence X-ray diffraction were used to examine the grain formation in HZO. The results show that metal ILs have successfully improved the ferroelectric performance by suppressing the nonferroelectric monoclinic phase while promoting the formation of the orthorhombic phase. The sample with W IL acting as electrodes for both upper and under HZO thin films was more resilient to fatigue than that with the Mo IL. Hence, W metal ILs can enable HZO implementation in a wider range of application.\",\"PeriodicalId\":13092,\"journal\":{\"name\":\"IEEE Transactions on Electron Devices\",\"volume\":\"71 11\",\"pages\":\"6647-6651\"},\"PeriodicalIF\":2.9000,\"publicationDate\":\"2024-09-24\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"IEEE Transactions on Electron Devices\",\"FirstCategoryId\":\"5\",\"ListUrlMain\":\"https://ieeexplore.ieee.org/document/10689517/\",\"RegionNum\":2,\"RegionCategory\":\"工程技术\",\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q2\",\"JCRName\":\"ENGINEERING, ELECTRICAL & ELECTRONIC\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"IEEE Transactions on Electron Devices","FirstCategoryId":"5","ListUrlMain":"https://ieeexplore.ieee.org/document/10689517/","RegionNum":2,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q2","JCRName":"ENGINEERING, ELECTRICAL & ELECTRONIC","Score":null,"Total":0}
引用次数: 0
摘要
自从前十年发现掺锆氧化铪(HZO)的铁电性(FE)以来,人们一直在对其进行深入研究。随着 HZO 被应用于多种领域,缩小晶粒尺寸对于提高铁电性能和可扩展性至关重要。一种常见的方法是在 HZO 薄膜中间加入介电中间层 (IL),但会因附加材料上的电压降而牺牲工作功率。这项研究在 HZO 叠层中间加入了 W 和 Mo 金属 IL,以防止晶粒生长。利用金属-铁电-绝缘体-硅结构研究了绝缘体对铁电性能的影响。透射电子显微镜(TEM)和掠入射 X 射线衍射被用来研究 HZO 中晶粒的形成。结果表明,金属绝缘体抑制了非铁电性单斜相,同时促进了正交相的形成,从而成功地改善了铁电性能。使用 W IL 作为上层和下层 HZO 薄膜电极的样品比使用 Mo IL 的样品具有更强的抗疲劳性。因此,金属 W IL 可使 HZO 的应用范围更广。
Metal Interlayer Insertion for Grain Engineering in Ferroelectric Hf₀.₅Zr₀.₅O₂
Since its discovery in the previous decade, ferroelectricity (FE) in zirconium-doped hafnium oxide (HZO) has been studied intensively. With HZO being incorporated in multiple applications, grain size reduction has become essential to enhance the ferroelectric performance and scalability. A common method is implementing a dielectric interlayer (IL) in the middle of HZO films while sacrificing operating power caused by voltage drop across the additional material. This research implemented W and Mo metal ILs in the middle of the HZO stack to prevent grain growth. The effects of the ILs on ferroelectric performance were studied using metal-ferroelectric–insulator-silicon structure. Transmission electron microscopy (TEM) and grazing-incidence X-ray diffraction were used to examine the grain formation in HZO. The results show that metal ILs have successfully improved the ferroelectric performance by suppressing the nonferroelectric monoclinic phase while promoting the formation of the orthorhombic phase. The sample with W IL acting as electrodes for both upper and under HZO thin films was more resilient to fatigue than that with the Mo IL. Hence, W metal ILs can enable HZO implementation in a wider range of application.
期刊介绍:
IEEE Transactions on Electron Devices publishes original and significant contributions relating to the theory, modeling, design, performance and reliability of electron and ion integrated circuit devices and interconnects, involving insulators, metals, organic materials, micro-plasmas, semiconductors, quantum-effect structures, vacuum devices, and emerging materials with applications in bioelectronics, biomedical electronics, computation, communications, displays, microelectromechanics, imaging, micro-actuators, nanoelectronics, optoelectronics, photovoltaics, power ICs and micro-sensors. Tutorial and review papers on these subjects are also published and occasional special issues appear to present a collection of papers which treat particular areas in more depth and breadth.