Mutant amplitude modulation behavior of MIS-like structure of few-layer graphene/SiO2/p-Si in 500–750 GHz band

Graphene has great application potential in the field of electromagnetic modulation field because of its excellent physical and electronic properties. Studies have demonstrated that the properties of graphene films with different layers are also different due to the difference in energy band structure. Nowadays, the modulation mechanism of monolayer graphene (MLG) and bilayer graphene (BLG) has been gradually discovered, but for graphene with more than three layers, the mechanism of whether it is tunable remains to be explored, especially on the proving from an experimental perspective. In this study, the CVD-prepared highly homogeneous few-layer graphene (FLG) film was combined with SiO₂ nanolayers and P-doped Si substrate to form an MIS-like capacitor structure, a unique electromagnetic behavior of mutant amplitude modulation exhibited by FLG film was found, which was different from that of mono- and bi-layers of graphene. The results show that the structure exhibits obvious modulation behavior in the ultra-wideband frequency of 500–750 GHz and the bias of 0.9 V, up to 3.1 dB. This study makes a new supplement to a gap in the EM modulation system of graphene series material.