压力对无缺陷和含缺陷熔融石英的电子和光学特性的影响:第一原理研究

IF 3.8 2区 材料科学 Q2 MATERIALS SCIENCE, MULTIDISCIPLINARY Vacuum Pub Date : 2024-11-26 DOI:10.1016/j.vacuum.2024.113881
Rongqi Shen , Yi Lu , Zhongxi Zhang
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引用次数: 0

摘要

熔融石英是一种广泛应用于高功率固体激光系统的光学材料。熔融石英的电子和光学特性受到材料中的点缺陷和应力的影响。本文采用第一原理方法计算了熔融石英的电子和光学特性。研究发现,无缺陷熔融石英材料的带隙随着压力的增加而逐渐减小。当熔融石英材料含有氧空位或硅空位缺陷时,带隙大小与压力不成正比。在弹性变形阶段,低应变和高应变会引起含缺陷熔融石英带隙大小的突然变化。本文从微应力的角度揭示了压力对无缺陷和含缺陷熔融石英材料带隙和光学特性的影响机理。
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Effects of pressure on the electronic and optical properties of defect-free and defect-containing fused silica: A first-principles study
Fused silica is a widely used optical material in high-power solid-state laser systems. The electronic and optical properties of fused silica are affected by point defects and stress in the material. In this paper, the electronic and optical properties of fused silica are calculated using the first-principles method. The study found that the band gap of defect-free fused silica material gradually decreases as the pressure increases. When the fused silica material contains oxygen vacancy or silicon vacancy defects, the band gap size is not proportional to pressure. During the elastic deformation stage, low strain and high strain cause a sudden change in the band gap size of defect-containing fused silica. This paper reveals the mechanism of the influence of pressure on the band gap and optical properties of defect-free and defect-containing fused silica materials from the perspective of micro-stress.
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来源期刊
Vacuum
Vacuum 工程技术-材料科学:综合
CiteScore
6.80
自引率
17.50%
发文量
0
审稿时长
34 days
期刊介绍: Vacuum is an international rapid publications journal with a focus on short communication. All papers are peer-reviewed, with the review process for short communication geared towards very fast turnaround times. The journal also published full research papers, thematic issues and selected papers from leading conferences. A report in Vacuum should represent a major advance in an area that involves a controlled environment at pressures of one atmosphere or below. The scope of the journal includes: 1. Vacuum; original developments in vacuum pumping and instrumentation, vacuum measurement, vacuum gas dynamics, gas-surface interactions, surface treatment for UHV applications and low outgassing, vacuum melting, sintering, and vacuum metrology. Technology and solutions for large-scale facilities (e.g., particle accelerators and fusion devices). New instrumentation ( e.g., detectors and electron microscopes). 2. Plasma science; advances in PVD, CVD, plasma-assisted CVD, ion sources, deposition processes and analysis. 3. Surface science; surface engineering, surface chemistry, surface analysis, crystal growth, ion-surface interactions and etching, nanometer-scale processing, surface modification. 4. Materials science; novel functional or structural materials. Metals, ceramics, and polymers. Experiments, simulations, and modelling for understanding structure-property relationships. Thin films and coatings. Nanostructures and ion implantation.
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