Deposition of VS2/MoS2 bilayer layers of 2D material on nickel inverse opal structural substrates by SILAR and ECD processes as supercapacitor electrodes.

The composition, microstructure, and electrochemical properties of the two kinds of thin film electrode materials, namely VS2/MoS2/Ni-IOS and VS2/MoS2/ Ni-foam, were analyzed. The research results indicate that the self-assembled photonic crystal templates with adjusted EPSA processing parameters (100 V/cm; 7 min) would lead to an FCC closest-packed structure. Metallic nickel inverse opal structure (IOS) photonic crystals whose thickness can be freely regulated simply by electrochemical deposition time. VS2 and MoS2 are 2D materials with excellent electrochemical properties. We employed them as the electroactive material in this study and deposited them onto Ni-IOS surfaces to form a composite of VS2/MoS2/Ni-IOS electrode materials. The specimens exhibited an excellent specific capacitance (2,180 F/g) at a charge-discharge current density of 5 A/g. After the 2,000 cycles during the life test, the sample can still retain the original specific capacitance value by 72.3%. The inverse opal structure photonic crystal substrate produced in this work is designed as VS2/MoS2/Ni-IOS supercapacitor electrode materials, which can offer a significant technical contribution to the application of 2-D materials in high-performance supercapacitors currently. .