ZnSe薄膜作为界面层的结构和光学特性分析

IF 2.8 4区 工程技术 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC Journal of Materials Science: Materials in Electronics Pub Date : 2025-01-18 DOI:10.1007/s10854-025-14221-3
Cansu Emir, Adem Tataroglu, Uğur Gökmen, Sema Bilge Ocak
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引用次数: 0

摘要

本研究揭示了对硒化锌(ZnSe)薄膜的光学和结构特征进行综合分析的结果。在玻璃基板上制备后,采用热蒸发法合成了所研究的薄膜。通过扫描电子显微镜(SEM)、能量色散x射线(EDX)和x射线衍射(XRD)对膜的结构特征进行了分析,证实了膜的多晶性质,并以立方锌-闪锌矿结构为主。通过扫描电镜观察的表面形貌显示出均匀的晶粒分布和最小的表面缺陷,表明形成了高质量的薄膜。为了研究其光学特性,在300 ~ 900 nm的光谱范围内采用了紫外-可见光谱法。利用紫外可见光谱数据,得到消光系数(k)、光学带隙(Eg)、折射率(n)、吸收系数(α)、光学电导率(σopt)等光学特性。利用紫外-可见光谱对这些光学性质进行了评估,揭示了约2.88 eV的直接带隙,这与ZnSe的体性质一致,适合光电应用。本研究结果清楚地表明,所研究的ZnSe薄膜可用于光电器件。
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Analysis of the structural and optical characteristics of ZnSe thin films as interface layer

This research reveals the results of a comprehensive analysis of the optical and structural features of zinc selenide (ZnSe) thin film. The studied film was synthesized using the thermal evaporation method after preparation on the glass substrate. The film’s structural characteristics, which have been determined by using scanning electron microscopy (SEM), energy dispersive X-ray (EDX), and X-ray diffraction (XRD), confirm the polycrystalline nature of the films with a predominant cubic zinc-blende structure. The surface morphology investigated through SEM reveals a uniform grain distribution with minimal surface defects, indicating high-quality film formation. In order to examine the optical characteristics, the ultraviolet–visible spectroscopy method is used in a spectral range between 300 and 900 nm. In this way, the ultraviolet–visible spectroscopy data are utilized to obtain optical features such as extinction coefficient (k), optical band gap (Eg), refractive index (n), absorption coefficient (α), and optical conductivity (σopt). These optical properties are assessed using ultraviolet–visible spectroscopy, revealing a direct band gap of approximately 2.88 eV, which is consistent with the bulk properties of ZnSe and suitable for optoelectronic applications. The results of this study clearly show that the studied ZnSe film can be used for optoelectronic device applications.

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来源期刊
Journal of Materials Science: Materials in Electronics
Journal of Materials Science: Materials in Electronics 工程技术-材料科学:综合
CiteScore
5.00
自引率
7.10%
发文量
1931
审稿时长
2 months
期刊介绍: The Journal of Materials Science: Materials in Electronics is an established refereed companion to the Journal of Materials Science. It publishes papers on materials and their applications in modern electronics, covering the ground between fundamental science, such as semiconductor physics, and work concerned specifically with applications. It explores the growth and preparation of new materials, as well as their processing, fabrication, bonding and encapsulation, together with the reliability, failure analysis, quality assurance and characterization related to the whole range of applications in electronics. The Journal presents papers in newly developing fields such as low dimensional structures and devices, optoelectronics including III-V compounds, glasses and linear/non-linear crystal materials and lasers, high Tc superconductors, conducting polymers, thick film materials and new contact technologies, as well as the established electronics device and circuit materials.
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