铌酸锂(LiNbO3)基金属-铁电-金属-绝缘体-半导体(MFMIS)NCFET的分析建模和准静态特性

IF 2.2 4区 工程技术 Q3 ENGINEERING, ELECTRICAL & ELECTRONIC Journal of Computational Electronics Pub Date : 2023-07-10 DOI:10.1007/s10825-023-02070-4
N. R. Saritha, J. Charles Pravin, V. Sandeep, Josephine Selle J, V. N. Ramakrishnan
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引用次数: 0

摘要

随着硅电路变得更加紧凑,降低功耗已成为主要目标。此外,超高度集成电路将不可避免地产生大量的热量。定义了一种新的数学建模方法,用于分析基于铁电体的负电容场效应晶体管(NCFET),该方法将充分解决极化开关和亚阈值行为的不均匀性。本研究分析了基于金属-铁电-金属-绝缘体-半导体NCFET的铌酸锂(LiNbO\(_{3}\))铁电材料的I–V和C–V特性。根据在考虑不同变量(如铁电材料、栅极偏置修改和铁电厚度)的情况下进行的校准,评估包括漏极电流、极化因子、电容、总电荷密度和亚阈值摆幅在内的器件参数。还使用Silvaco ATLAS TCAD工具进行了数值模拟,以模拟和校准上述参数。最初进行MATLAB模拟以求解铁电一维Landau–Khalatnikov方程,然后将其用于后续分析。所提出的器件在低铁电厚度下也开始表现出磁滞行为。模拟表明,潜在曲线增加了45%,从而证明该设备是低功耗应用的可行竞争者。
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Analytical modeling and quasi-static characterization of a lithium niobate (LiNbO3)-based metal–ferroelectric–metal–insulator–semiconductor (MFMIS) NCFET

Lowering power consumption has emerged as the primary goal as silicon circuits become more compact. Furthermore, the ultra-highly integrated circuit will unavoidably generate a substantial amount of heat. A novel mathematical modeling method is defined for the analysis of a ferroelectric-based negative capacitance field-effect transistor (NCFET) that will adequately address the non-uniformity in polarization switching and subthreshold behavior. This study analyses the I–V and C–V properties of a lithium niobate (LiNbO\(_{3}\)) ferroelectric material-based metal–ferroelectric–metal–insulator–semiconductor NCFET. Device parameters including drain current, polarization factor, capacitance, total charge density, and subthreshold swing are evaluated in accordance with the calibration performed considering different variables, such as ferroelectric materials, gate bias modification, and ferroelectric thickness. Numerical simulation is also performed using the Silvaco ATLAS TCAD tool to simulate and calibrate the above-mentioned parameters. MATLAB simulation is initially performed to solve the ferroelectric 1-D Landau–Khalatnikov equation, which is then used for subsequent analyses. The proposed device also starts to exhibit hysteresis behavior at low ferroelectric thicknesses. The simulations demonstrate a 45% increase in the potential curve, thus proving the device to be a viable contender for low-power applications.

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来源期刊
Journal of Computational Electronics
Journal of Computational Electronics ENGINEERING, ELECTRICAL & ELECTRONIC-PHYSICS, APPLIED
CiteScore
4.50
自引率
4.80%
发文量
142
审稿时长
>12 weeks
期刊介绍: he Journal of Computational Electronics brings together research on all aspects of modeling and simulation of modern electronics. This includes optical, electronic, mechanical, and quantum mechanical aspects, as well as research on the underlying mathematical algorithms and computational details. The related areas of energy conversion/storage and of molecular and biological systems, in which the thrust is on the charge transport, electronic, mechanical, and optical properties, are also covered. In particular, we encourage manuscripts dealing with device simulation; with optical and optoelectronic systems and photonics; with energy storage (e.g. batteries, fuel cells) and harvesting (e.g. photovoltaic), with simulation of circuits, VLSI layout, logic and architecture (based on, for example, CMOS devices, quantum-cellular automata, QBITs, or single-electron transistors); with electromagnetic simulations (such as microwave electronics and components); or with molecular and biological systems. However, in all these cases, the submitted manuscripts should explicitly address the electronic properties of the relevant systems, materials, or devices and/or present novel contributions to the physical models, computational strategies, or numerical algorithms.
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