Chaehun Lim, Seongmin Ha, Naeun Ha, Seo Gyeong Jeong, Young-Seak Lee
{"title":"CFX的等离子体处理：表面化学改性与表面蚀刻的结合效应","authors":"Chaehun Lim, Seongmin Ha, Naeun Ha, Seo Gyeong Jeong, Young-Seak Lee","doi":"10.1007/s42823-023-00597-x","DOIUrl":null,"url":null,"abstract":"<div><p>The effects of different plasma agent species (CF<sub>4</sub>, N<sub>2</sub>) over the conductivity of CF<sub>X</sub> cathode material were identified. Both plasma treatments have surface etching effect, while the CF<sub>4</sub> plasma treatment has C–F bond modification effect and the N<sub>2</sub> plasma treatment has defluorination effect. The changes of surface chemical species and porosity along the plasma agent were elucidated. Moreover, the electrochemical properties of plasma-treated CF<sub>X</sub> confirmed the effects of plasma treatments. The charge-transfer resistance of plasma-treated CF<sub>X</sub> was maximum 60.3% reduced than the pristine CF<sub>X</sub>. The effects of surface chemical modification coupled with etching along the plasma gas agents were compared and identified with their reaction mechanisms.</p></div>","PeriodicalId":506,"journal":{"name":"Carbon Letters","volume":"34 2","pages":"611 - 617"},"PeriodicalIF":5.5000,"publicationDate":"2023-09-05","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Plasma treatment of CFX: the effect of surface chemical modification coupled with surface etching\",\"authors\":\"Chaehun Lim, Seongmin Ha, Naeun Ha, Seo Gyeong Jeong, Young-Seak Lee\",\"doi\":\"10.1007/s42823-023-00597-x\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"<div><p>The effects of different plasma agent species (CF<sub>4</sub>, N<sub>2</sub>) over the conductivity of CF<sub>X</sub> cathode material were identified. Both plasma treatments have surface etching effect, while the CF<sub>4</sub> plasma treatment has C–F bond modification effect and the N<sub>2</sub> plasma treatment has defluorination effect. The changes of surface chemical species and porosity along the plasma agent were elucidated. Moreover, the electrochemical properties of plasma-treated CF<sub>X</sub> confirmed the effects of plasma treatments. The charge-transfer resistance of plasma-treated CF<sub>X</sub> was maximum 60.3% reduced than the pristine CF<sub>X</sub>. The effects of surface chemical modification coupled with etching along the plasma gas agents were compared and identified with their reaction mechanisms.</p></div>\",\"PeriodicalId\":506,\"journal\":{\"name\":\"Carbon Letters\",\"volume\":\"34 2\",\"pages\":\"611 - 617\"},\"PeriodicalIF\":5.5000,\"publicationDate\":\"2023-09-05\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Carbon Letters\",\"FirstCategoryId\":\"88\",\"ListUrlMain\":\"https://link.springer.com/article/10.1007/s42823-023-00597-x\",\"RegionNum\":3,\"RegionCategory\":\"材料科学\",\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q2\",\"JCRName\":\"CHEMISTRY, MULTIDISCIPLINARY\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Carbon Letters","FirstCategoryId":"88","ListUrlMain":"https://link.springer.com/article/10.1007/s42823-023-00597-x","RegionNum":3,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q2","JCRName":"CHEMISTRY, MULTIDISCIPLINARY","Score":null,"Total":0}
Plasma treatment of CFX: the effect of surface chemical modification coupled with surface etching
The effects of different plasma agent species (CF4, N2) over the conductivity of CFX cathode material were identified. Both plasma treatments have surface etching effect, while the CF4 plasma treatment has C–F bond modification effect and the N2 plasma treatment has defluorination effect. The changes of surface chemical species and porosity along the plasma agent were elucidated. Moreover, the electrochemical properties of plasma-treated CFX confirmed the effects of plasma treatments. The charge-transfer resistance of plasma-treated CFX was maximum 60.3% reduced than the pristine CFX. The effects of surface chemical modification coupled with etching along the plasma gas agents were compared and identified with their reaction mechanisms.
期刊介绍：
Carbon Letters aims to be a comprehensive journal with complete coverage of carbon materials and carbon-rich molecules. These materials range from, but are not limited to, diamond and graphite through chars, semicokes, mesophase substances, carbon fibers, carbon nanotubes, graphenes, carbon blacks, activated carbons, pyrolytic carbons, glass-like carbons, etc. Papers on the secondary production of new carbon and composite materials from the above mentioned various carbons are within the scope of the journal. Papers on organic substances, including coals, will be considered only if the research has close relation to the resulting carbon materials. Carbon Letters also seeks to keep abreast of new developments in their specialist fields and to unite in finding alternative energy solutions to current issues such as the greenhouse effect and the depletion of the ozone layer. The renewable energy basics, energy storage and conversion, solar energy, wind energy, water energy, nuclear energy, biomass energy, hydrogen production technology, and other clean energy technologies are also within the scope of the journal. Carbon Letters invites original reports of fundamental research in all branches of the theory and practice of carbon science and technology.
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