衬底温度对超声喷雾热解制备Co掺杂SnS2薄膜物理性能的影响

IF 1.2 4区 材料科学 Q4 MATERIALS SCIENCE, MULTIDISCIPLINARY Chalcogenide Letters Pub Date : 2023-08-01 DOI:10.15251/cl.2023.208.587
Z. Hadef, K. Kamli, O. Kamli, S. Labiod
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引用次数: 0

摘要

采用超声喷雾热解法(USP)在不同的衬底温度(Ts = 350℃、375℃、400℃和425℃)下在玻璃衬底上沉积Co掺杂SnS2薄膜。DRX谱图显示合成的薄膜为纯SnS2相,具有六方结构。随着衬底温度的升高,平均晶粒尺寸在15.67 ~ 29.84 nm之间呈增减趋势。SEM图像受衬底温度的影响较大。随着衬底温度的升高,光学带隙从2.62 eV增加到3.00 eV。霍尔效应测量证实了沉积膜的n型电导率。膜的电阻率在117 Ω之间变化。厘米到0.20 Ω。随着衬底温度从350°C升高到425°C,
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Effect of substrate temperature on physical properties of Co doped SnS2 thin films deposited by ultrasonic spray pyrolysis
Ultrasonic Spray Pyrolysis (USP) was used to deposited Co doped SnS2 thin films on a glass substrate at different substrate temperatures (Ts = 350 °C, 375 °C, 400 °C, and 425 °C). DRX patterns shows that the synthesized films revealed a pure SnS2 phase with hexagonal structure. The mean crystalline grain sizes were showed an increasing– decreasing trend between 15.67 and 29.84 nm with an increment in the substrate temperature. The SEM images were significantly affected by the substrate temperature. Also, the optical band gap increases from 2.62 to 3.00 eV with the substrate temperatures increasing. Hall Effect measurements confirm the n-type conductivity of the as-deposited films. Furthermore, the films resistivity varies between 117 Ω.cm to 0.20 Ω.cm, as the substrate temperature increases from 350 to 425 °C.
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来源期刊
Chalcogenide Letters
Chalcogenide Letters MATERIALS SCIENCE, MULTIDISCIPLINARY-PHYSICS, APPLIED
CiteScore
1.80
自引率
20.00%
发文量
86
审稿时长
1 months
期刊介绍: Chalcogenide Letters (CHL) has the aim to publish rapidly papers in chalcogenide field of research and appears with twelve issues per year. The journal is open to letters, short communications and breakings news inserted as Short Notes, in the field of chalcogenide materials either amorphous or crystalline. Short papers in structure, properties and applications, as well as those covering special properties in nano-structured chalcogenides are admitted.
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