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Enhancement efficiency of cadmium selenium solar cell by doping within silver 银内掺杂提高镉硒太阳能电池效率
4区 材料科学 Q4 MATERIALS SCIENCE, MULTIDISCIPLINARY Pub Date : 2023-11-10 DOI: 10.15251/cl.2023.2010.733
M. H. Mustafa, H. M. Ali, G. S. Ahmed, B. H. Hussein
We studied at the morphology, structural setup, and optical characteristics of thin cadmium (CdSe) films a thickness of 250 nm that were created by thermal evaporation over glass, The films exhibited a hexagonal shape were crystalline, and tended to form grains in the (111) crystallographic direction, according to the X-ray diffraction examinations. These characteristics were established using the investigation's findings. Through the use of thin films of CdSe doped with Ag at a concentration of 1.5%, the crystal structure orientations for pure CdSe (25.32, 41.84) and CdSe:Ag (25.39, 41.01) that were both pure as well as those that were doped with silver were both determined. The band gap of the optical spectrum decreased by 1.93–1.81 eV (300–700 nm). This reduced the rate of absorption measuring the current-voltage properties of heterojunctions made from a range of clean and doped materials with an incident electrical power density of (100 mW/cm2 ). The films' hexagonal structure was revealed by the X-ray investigation, and grain development was driven by the (220,111) crystallographic direction.
我们研究了250 nm厚的镉(CdSe)薄膜的形貌、结构设置和光学特性,该薄膜在玻璃上通过热蒸发产生,薄膜呈现六角形结晶,并且根据x射线衍射检查倾向于形成(111)晶体方向的晶粒。这些特征是根据调查结果确定的。通过使用掺银浓度为1.5%的CdSe薄膜,确定了纯CdSe(25.32, 41.84)和纯CdSe:Ag(25.39, 41.01)的晶体结构取向,以及掺杂银的CdSe:Ag(25.39, 41.01)。光谱带隙减小1.93 ~ 1.81 eV (300 ~ 700 nm)。这降低了测量由一系列清洁和掺杂材料制成的异质结的电流-电压特性的吸收速率,入射电功率密度为(100 mW/cm2)。x射线衍射显示薄膜为六角形结构,晶粒发育受(220,111)晶体学方向驱动。
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引用次数: 0
Study of structural, morphological and optical properties of Mn+2 doped CdS nanoparticles synthesized at various doping concentration 不同掺杂浓度下Mn+2掺杂CdS纳米颗粒的结构、形态和光学性质研究
4区 材料科学 Q4 MATERIALS SCIENCE, MULTIDISCIPLINARY Pub Date : 2023-11-10 DOI: 10.15251/cl.2023.2010.709
R. Ranjan, C. M. S. Negi, S. K. Choubey, K. P. Tiwary
Manganese-doped cadmium sulphide semiconductor nanoparticles (CdS: Mn) NPs have been created utilizing a microwave-assisted solvothermal technique at different Mn concentrations (0, 1%, 3%, and 5%). The chemicals utilized for the preparation of Mndoped CdS nanoparticles were sodium sulphide (Na2S.xH2O), manganese chloride (MnCl2.4H2O), and cadmium acetate (CH3COO)2Cd., H2O). To determine the structural dimensions of the generated nanoparticles, the Debye-Scherer equation was used to calculate the average crystallite size at the full-width half maximum (FWHM) of the diffraction peaks. FTIR spectra analysis was used to look at the various functional and vibrational groups present in the Mn-doped CdS nanoparticle sample. The structure features of the produced nanoparticles have been examined using X-ray diffraction patterns. Energy dispersive X-rays were employed to ascertain the chemical composition of the synthesized nanoparticles. The optical properties and quantification of the energy band gap of the nanoparticles have been done using UV-V spectroscopy. According to XRD calculations, the cubic zinc-blend structure of the generated NPs had a crystal size of between 4 and 7 nm. By using EDX spectroscopy, the incorporation of Mn at the CdS lattice was confirmed.
利用微波辅助溶剂热技术在不同Mn浓度(0,1%,3%和5%)下制备了锰掺杂的硫化镉半导体纳米粒子(CdS: Mn) NPs。用于制备mn掺杂CdS纳米粒子的化学物质是硫化钠(Na2S.xH2O)、氯化锰(MnCl2.4H2O)和醋酸镉(CH3COO)2Cd。、水)。为了确定纳米颗粒的结构尺寸,采用Debye-Scherer方程计算了衍射峰全宽半最大值(FWHM)处的平均晶粒尺寸。FTIR光谱分析用于观察mn掺杂CdS纳米颗粒样品中存在的各种功能和振动基团。用x射线衍射图检测了所制备纳米颗粒的结构特征。利用能量色散x射线确定合成纳米粒子的化学成分。利用紫外-紫外光谱对纳米粒子的光学性质和能带隙进行了定量分析。根据XRD计算,生成的纳米粒子的立方锌共混结构的晶体尺寸在4 ~ 7 nm之间。通过EDX光谱分析,证实了锰在CdS晶格处的掺入。
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引用次数: 0
Influence of deposition voltage on tribological properties of W-WS2 coatings deposited by electrospark deposition 沉积电压对电火花沉积W-WS2涂层摩擦学性能的影响
4区 材料科学 Q4 MATERIALS SCIENCE, MULTIDISCIPLINARY Pub Date : 2023-11-10 DOI: 10.15251/cl.2023.2010.741
T. X. Liu, C. A. Guo, F. S. Lu, X. Y. Zhang, L. Zhang, Z. J. Wang, Z. Y. Xu, G. L. Zhu
Electrospark deposition coatings were prepared with different deposition voltage on CrNi3MoVA steel substrates by using a W-WS2 sintered electrode and their tribological properties were investigated. The microhardness, roughness and tribological properties of the coatings were tested by using Vickers hardness tester, confocal laser scanning microscope and tribometer, and the morphologies, composition and phase structure were obtained by utilizing scanning electron microscopy (SEM), energy dispersive X-ray spectrum (EDS) and X-ray diffraction(XRD). The results showed that with the increase of deposition voltage, the hardness and roughness of the coatings increase. The coatings remarkably increase the tribological properties of CrNi3MoVA steel, and among the three coatings deposited at 40 V, 60 V and 80 V, the coating deposited at 60 V has the smallest friction coefficient and the best wear resistance.
采用W-WS2烧结电极在CrNi3MoVA钢基体上制备了不同沉积电压下的电火花沉积涂层,并对其摩擦学性能进行了研究。采用维氏硬度计、激光共聚焦扫描显微镜和摩擦计测试了涂层的显微硬度、粗糙度和摩擦学性能,并利用扫描电镜(SEM)、能谱仪(EDS)和x射线衍射仪(XRD)分析了涂层的形貌、组成和相结构。结果表明,随着沉积电压的增大,镀层的硬度和粗糙度均增大。涂层显著提高了CrNi3MoVA钢的摩擦学性能,在40v、60v和80v下沉积的涂层中,60v下沉积的涂层摩擦系数最小,耐磨性最好。
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引用次数: 0
Nucleation and growth study of SnS nanostructures prepared by electrodeposition method 电沉积法制备SnS纳米结构的成核与生长研究
4区 材料科学 Q4 MATERIALS SCIENCE, MULTIDISCIPLINARY Pub Date : 2023-11-10 DOI: 10.15251/cl.2023.2010.753
A. Nouri, D. Dekhil, H. Guessas
SnS nanostructures were prepared using the electrodeposition technique in aqueous solutions containing 0.1M of SnSO4 and Na2SO4. Three concentrations (0.05M, 0.10M, and 0.15M) of Na2SO4 were tested. The electrodeposition of SnS nanostructures on ITO substrates was investigated by cyclic voltammetry, chronoamperometry, SEM microscopy, and X-ray diffraction techniques. The concentration-dependent nucleation and growth mechanisms of electrodeposited SnS were analyzed using current transients. For the concentrations (0.05M and 0.10 M), the SnS films follow 3D growth in instantaneous nucleation mode. For a concentration of 0.15M, the SnS films start with progressive nucleation before switching to the instantaneous nucleation mode. The SnS nanostructures produced were found to be polycrystalline with an orthorhombic structure. XRD measurement shows that the preferred orientation of SnS nanostructures is in the (111) and (101) directions for the lower concentrations. SEM images reveal the 3D growth model of the samples, which is consistent with the electrochemical analysis.
采用电沉积技术在0.1M SnSO4和Na2SO4水溶液中制备了SnS纳米结构。测试了0.05M、0.1 m、0.15M三种浓度的Na2SO4。利用循环伏安法、计时安培法、扫描电镜和x射线衍射技术研究了在ITO衬底上电沉积SnS纳米结构的过程。利用电流瞬态分析了电沉积SnS的成核和生长机制。在0.05M和0.10 M浓度下,SnS薄膜以瞬时成核方式三维生长。当浓度为0.15M时,SnS薄膜从渐进式成核开始,然后转变为瞬时成核模式。制备的SnS纳米结构为多晶正交结构。XRD测试结果表明,在较低浓度下,SnS纳米结构的优先取向是(111)和(101)方向。SEM图像显示了样品的三维生长模型,与电化学分析结果一致。
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引用次数: 0
Thermal conductivity and lattice dynamics of thermoelectric oxychalcogenide BiCuTeO 热电性氧硫族化合物BiCuTeO的热导率和晶格动力学
4区 材料科学 Q4 MATERIALS SCIENCE, MULTIDISCIPLINARY Pub Date : 2023-11-10 DOI: 10.15251/cl.2023.2010.697
M. Guenfoud, M. Hamouda
Recently, BiCuTeO is considered as one of the promising thermoelectric materials due to its ultra-low thermal conductivity. For this reason, the thermoelectric characteristic of this material has been studied to evaluate the lattice thermal conductivity (𝜅𝜅𝐿𝐿) from firstprinciples calculations which are based on solving linearized Boltzmann transport equations (LBTE) through the relaxation time (RTA) approximation. These calculations are used to predict the behavior of phonons in order to understand the origin of the ultralow thermal conductivity of BiCuTeO. The lattice thermal conductivity of BiCuTeO is reproduced with high accuracy. Our calculations predict that BiCuTeO announces a strong anharmonicity, which is the cause of the very low value of the thermal conductivity. This results in very high group speeds. Moreover, the calculations of the elastic properties, dielectric constants, phonon group velocities, lifetimes, and Grüneisen parameters shows that the lattice thermal conductivity exhibits an obvious anisotropy.
近年来,BiCuTeO因其超低导热性被认为是一种很有前途的热电材料。为此,研究了该材料的热电特性,通过弛豫时间(RTA)近似求解线性化玻尔兹曼输运方程(LBTE)的第一性原理计算来评估晶格导热系数(𝜅𝜅𝐿𝐿)。这些计算被用来预测声子的行为,以了解BiCuTeO超低导热性的起源。对BiCuTeO的晶格热导率进行了高精度的再现。我们的计算表明,BiCuTeO表现出很强的非谐性,这是导致导热系数非常低的原因。这导致了非常高的组速度。此外,通过弹性性质、介电常数、声子群速度、寿命和颗粒 neisen参数的计算表明,晶格导热系数具有明显的各向异性。
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引用次数: 0
Retraction notice: Optimization of chemical bath deposited CdSSe thin films 撤回通知:化学浴沉积CdSSe薄膜的优化
4区 材料科学 Q4 MATERIALS SCIENCE, MULTIDISCIPLINARY Pub Date : 2023-11-10 DOI: 10.15251/cl.2023.2010.751
M. A. Jafarov, E. F. Nasirov, V. Mammadov, S. A. Jahangirova
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引用次数: 0
Steady-state and transient photocurrents of As-S-Sb-Te amorphous thin films As-S-Sb-Te非晶薄膜的稳态和瞬态光电流
4区 材料科学 Q4 MATERIALS SCIENCE, MULTIDISCIPLINARY Pub Date : 2023-11-10 DOI: 10.15251/cl.2023.2010.725
O. V. Iaseniuc, M. S. Iovu
In the present work some nanostructured quaternary chalcogenides of the As-S-Sb-Te system have been investigated by a photoelectric method. The spectral distribution of steadystate photocurrent Iph=(λ) and the relaxation curves of photocurrent Iph=(t) were registered at positive and negative polarity of the applied voltage to the top Al illuminated electrode. In the spectral distribution of steady-state photocurrent, for the amorphous thin films As1.17S2.7Sb0.83Te0.40, As1.04S2.4Sb0.96Te0.60, As0.63S2.7Sb1.37Te0.30, and As0.56S2.4Sb1.44Te0.60 in the wavelength range λ=0.50÷0.92 mm (2.48÷1.35 eV) some maxima were detected, which are the result of the presence of binary clusters As2S3, Sb2S3 and Sb2S3. The photovoltaic method was used to obtain the value of the band gap width, which was about Eg =1.41 eV.
本文用光电方法研究了As-S-Sb-Te体系中一些纳米结构的四元硫族化合物。在顶铝照射电极的正负极性处,记录了稳态光电流Iph=(λ)的光谱分布和光电流Iph=(t)的弛豫曲线。在稳态光电流的光谱分布中,在λ=0.50÷0.92 mm (2.48÷1.35 eV)波长范围内,As1.17S2.7Sb0.83Te0.40、As1.04S2.4Sb0.96Te0.60、As0.63S2.7Sb1.37Te0.30和As0.56S2.4Sb1.44Te0.60等非晶态薄膜的光电流存在最大值,这是As2S3、Sb2S3和Sb2S3双星团簇存在的结果。利用光伏法得到带隙宽度的值,约为Eg =1.41 eV。
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引用次数: 0
Effect of Cu ratios dopant on ZnSe thin films structural and optical properties Cu比掺杂对ZnSe薄膜结构和光学性能的影响
4区 材料科学 Q4 MATERIALS SCIENCE, MULTIDISCIPLINARY Pub Date : 2023-11-01 DOI: 10.15251/cl.2023.2011.759
M. N. Abdel-Salam, N. Sabry, E. S. Yousef, E. R. Shaaban
This study focused to prepare poly-crystalline (ZnSe)1-x Cux thin films, where x values vary from 0 to 0.1 %. the effect of Cu ratios dopant on structural, phases and optical properties has been investigated. As prepared thin films were deposited onto a cleaning glass substrate under high vacuum conditions (10-7 mbr) at room temperature using the “ evaporation technique”. The analysis results according to data of the X-ray diffraction technique of all films refer to the growth polycrystalline with hexagonal wurtzite structure of Zn-Se with no presence of any further phases. The changes in numerous parameters such as volume of the unit cell, atomic packing factor, dislocation density, lattice constant and bond length with the Cu ratio were estimated and described. As well, the crystallite sizes,D, the lattice micro-strain,ε and dislocation density,δ have been calculated the results evidence that the micro-structural parameters enhancement with increment Cu atoms. On the other hand, the optical parameters of the as-synthesized films (ZnSe)1-xCux (0 ≤ x ≤ 0.1) were performed utilizing “UV–V is spectro -photometer” with a wavelength range of 300 to 2400 nm. The results show that as the Cu ratio increases, the absorption edge shifts to a higher wavelength and the optical band gap, Eg opt decreases from 2.63 eV to 2.52 eV. Finally, the behaviour of the optical constant parameters as real,εr/ imaginary, εi parts, dissipation factor,tan δ, volume/surface energy loss functions and dispersion parameters were shown to depend on the variation of the Cu ratio and wavelengths.
本研究的重点是制备多晶(ZnSe)1-x Cux薄膜,其中x值从0到0.1%不等。研究了铜比掺杂对结构、物相和光学性能的影响。在高真空条件下(10- 7mbr),在室温下使用“蒸发技术”将制备好的薄膜沉积在清洁玻璃基板上。根据所有薄膜的x射线衍射技术数据分析结果为生长的具有六方纤锌矿结构的Zn-Se多晶,没有任何其他相的存在。估计并描述了单元胞体积、原子填充系数、位错密度、晶格常数和键长等参数随Cu比的变化。同时,对晶体尺寸D、晶格微应变、ε和位错密度δ进行了计算,结果表明,随着Cu原子的增加,微观结构参数有所增强。另一方面,利用波长范围为300 ~ 2400 nm的“UV-V分光光度计”测定了合成膜(ZnSe)1-xCux(0≤x≤0.1)的光学参数。结果表明:随着Cu比的增大,吸收边向更高波长移动,带隙从2.63 eV减小到2.52 eV;结果表明,光学常数参数实部、εr/虚部、εi部、耗散因子、tan δ、体积/表面能损失函数和色散参数随Cu比和波长的变化而变化。
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引用次数: 0
Synthesis of wittichenite Cu3BiS3 thin films by sulfurizing thermally evaporated Cu-Bi metallic stacks 通过硫化热蒸发铜铋金属叠层合成维氏铜铋(Cu3BiS3)薄膜
IF 1 4区 材料科学 Q4 MATERIALS SCIENCE, MULTIDISCIPLINARY Pub Date : 2023-11-01 DOI: 10.15251/cl.2023.2011.797
U. Chalapathi, P. R. Prasad, C. P. Reddy, S. Sambasivam, P. Rosaiah, M. Ouladsmane, S. Alhammadi, S.M. Lee, S.H. Park
Wittichenite Cu3BiS3 thin films have received significant interest as light harvesters owing to their suitable optoelectronic properties and presence of earth-abundant, and non-toxic elements. We have synthesized Cu3BiS3 thin films by a two-stage process; in which, Cu/Bi/Cu metallic stacks were thermally evaporated and then sulfurized at 400 o C for 10–60 min in a quartz tubular furnace. The influence of sulfurization time on the structural, microstructural, compositional, optical, and electrical properties of the films was investigated. The results revealed that the films were orthorhombic Cu3BiS3 with the following lattice parameters: a = 0.768 nm; b = 1.043 nm; and c = 0.674 nm. Films uniformity, compactness, and crystal grain size increased upon increasing the sulfurization duration. On increasing the sulfurization time, the elemental stoichiometry of the films improved, and the direct optical bandgap increased from 1.38 to 1.40 eV. Additionally, Cu3BiS3 films exhibited p-type electrical conductivity and the electrical resistivity decreased with the increasing sulfurization time. Consequently, the Cu3BiS3 films synthesized at 30- and 60-min sulfurization durations can be applied to thin-film solar cells.
Wittichenite Cu3BiS3 薄膜具有合适的光电特性,并含有丰富的地球无毒元素,因此作为光收集器受到广泛关注。我们采用两步法合成了 Cu3BiS3 薄膜;其中,Cu/Bi/Cu 金属叠层经热蒸发后,在石英管式炉中于 400 o C 下硫化 10-60 分钟。研究了硫化时间对薄膜结构、微观结构、成分、光学和电学特性的影响。结果表明,薄膜为正交菱形 Cu3BiS3,晶格参数如下:a = 0.768 nm;b = 1.043 nm;c = 0.674 nm。随着硫化时间的延长,薄膜的均匀性、致密性和晶粒尺寸都有所增加。随着硫化时间的延长,薄膜的元素化学计量得到改善,直接光带隙从 1.38 eV 增加到 1.40 eV。此外,Cu3BiS3 薄膜表现出 p 型导电性,电阻率随着硫化时间的延长而降低。因此,硫化时间分别为 30 分钟和 60 分钟的 Cu3BiS3 薄膜可应用于薄膜太阳能电池。
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引用次数: 0
The structure polymer/As-Se-S doped by Bi for X-ray imaging 用于 X 射线成像的掺铒聚合物/砷-硒-硒结构
IF 1 4区 材料科学 Q4 MATERIALS SCIENCE, MULTIDISCIPLINARY Pub Date : 2023-11-01 DOI: 10.15251/cl.2023.2011.803
A. Chirita, A. Hustuc, N. Nasedchina, S. Vatavu
The polymer/67at %(As2S3)0,985(Bi2Se3)0,015:33 at.% As2Se3 structure for X-ray imaging has been investigated. The possibility of registering relief-phase images for radiation of “white” spectrum of tungsten anode X-ray tube was shown.
研究了用于 X 射线成像的聚合物/67%(As2S3)0,985(Bi2Se3)0,015:33% As2Se3 结构。结果表明,在钨阳极 X 射线管的 "白 "光谱辐射下,可以记录浮雕相图像。
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引用次数: 0
期刊
Chalcogenide Letters
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