Vijaya G. , Muralidhar Singh M. , Manish Kumar , Amit Kumar , Ashok Kumar M.S. , Dheeraj Kumar , Shatrudhan Pandey , S.M. Mozammil Hasnain , Abhishek Kumar Singh , Gaurav Kumar
{"title":"用于能源应用的溅射沉积陶瓷薄膜涂层的纳米压痕研究","authors":"Vijaya G. , Muralidhar Singh M. , Manish Kumar , Amit Kumar , Ashok Kumar M.S. , Dheeraj Kumar , Shatrudhan Pandey , S.M. Mozammil Hasnain , Abhishek Kumar Singh , Gaurav Kumar","doi":"10.1016/j.mset.2023.08.001","DOIUrl":null,"url":null,"abstract":"<div><p>Nanoindentation technique is generally used for measuring thinfilm mechanical properties such as hardness, modulus and stiffness. Nanoindentation of ceramic thinfilms of SiO<sub>2,</sub> Si<sub>3</sub>N<sub>4</sub> and Al<sub>2</sub>O<sub>3</sub> was deposited by radio-frequency (RF) magnetron sputtering on the stainless steel (SS304) substrates using a nanoindenter. Under varied sputtering conditions, the “as-deposited” film was amorphous. The as-deposited thin film had a thickness of 200 nm. The amorphous film was loaded/unloaded only once while operating in load control mode. Hardness and Young's modulus, two mechanical properties of the ceramic thinfilms, were also measured. When SiO<sub>2</sub>, Si<sub>3</sub>N<sub>4</sub>, and Al<sub>2</sub>O<sub>3</sub> thinfilms are deposited onto stainless steel substrates using an RF magnetron sputtering, the roughness of the ceramic thinfilms is in the range of 8 to 12 nm. The nanoindentation results were compared, the hardness of the coatings is in the range of 6 to 9 GPa, and these ceramic coatings can be used as an adhesive layer for multilayer thin film coating.</p></div>","PeriodicalId":18283,"journal":{"name":"Materials Science for Energy Technologies","volume":"7 ","pages":"Pages 115-123"},"PeriodicalIF":0.0000,"publicationDate":"2023-08-20","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Nano indentation studies on ceramic thinfilms coatings deposited using sputtering process for energy applications\",\"authors\":\"Vijaya G. , Muralidhar Singh M. , Manish Kumar , Amit Kumar , Ashok Kumar M.S. , Dheeraj Kumar , Shatrudhan Pandey , S.M. Mozammil Hasnain , Abhishek Kumar Singh , Gaurav Kumar\",\"doi\":\"10.1016/j.mset.2023.08.001\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"<div><p>Nanoindentation technique is generally used for measuring thinfilm mechanical properties such as hardness, modulus and stiffness. Nanoindentation of ceramic thinfilms of SiO<sub>2,</sub> Si<sub>3</sub>N<sub>4</sub> and Al<sub>2</sub>O<sub>3</sub> was deposited by radio-frequency (RF) magnetron sputtering on the stainless steel (SS304) substrates using a nanoindenter. Under varied sputtering conditions, the “as-deposited” film was amorphous. The as-deposited thin film had a thickness of 200 nm. The amorphous film was loaded/unloaded only once while operating in load control mode. Hardness and Young's modulus, two mechanical properties of the ceramic thinfilms, were also measured. When SiO<sub>2</sub>, Si<sub>3</sub>N<sub>4</sub>, and Al<sub>2</sub>O<sub>3</sub> thinfilms are deposited onto stainless steel substrates using an RF magnetron sputtering, the roughness of the ceramic thinfilms is in the range of 8 to 12 nm. The nanoindentation results were compared, the hardness of the coatings is in the range of 6 to 9 GPa, and these ceramic coatings can be used as an adhesive layer for multilayer thin film coating.</p></div>\",\"PeriodicalId\":18283,\"journal\":{\"name\":\"Materials Science for Energy Technologies\",\"volume\":\"7 \",\"pages\":\"Pages 115-123\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2023-08-20\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Materials Science for Energy Technologies\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://www.sciencedirect.com/science/article/pii/S2589299123000447\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q1\",\"JCRName\":\"Materials Science\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Materials Science for Energy Technologies","FirstCategoryId":"1085","ListUrlMain":"https://www.sciencedirect.com/science/article/pii/S2589299123000447","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q1","JCRName":"Materials Science","Score":null,"Total":0}
Nano indentation studies on ceramic thinfilms coatings deposited using sputtering process for energy applications
Nanoindentation technique is generally used for measuring thinfilm mechanical properties such as hardness, modulus and stiffness. Nanoindentation of ceramic thinfilms of SiO2, Si3N4 and Al2O3 was deposited by radio-frequency (RF) magnetron sputtering on the stainless steel (SS304) substrates using a nanoindenter. Under varied sputtering conditions, the “as-deposited” film was amorphous. The as-deposited thin film had a thickness of 200 nm. The amorphous film was loaded/unloaded only once while operating in load control mode. Hardness and Young's modulus, two mechanical properties of the ceramic thinfilms, were also measured. When SiO2, Si3N4, and Al2O3 thinfilms are deposited onto stainless steel substrates using an RF magnetron sputtering, the roughness of the ceramic thinfilms is in the range of 8 to 12 nm. The nanoindentation results were compared, the hardness of the coatings is in the range of 6 to 9 GPa, and these ceramic coatings can be used as an adhesive layer for multilayer thin film coating.
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