用于光电子应用的Ge18Bi4Se78硫族化物玻璃的结构、光学和电学特性

S.K. Mohamed, M.M. Abd El-Raheem, M.M. Wakkad, A.M. Abdel Hakeeam, H.F. Mohamed
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引用次数: 0

摘要

采用熔融淬火和热蒸发技术分别制备了硫族化物玻璃Ge18Bi4Se78粉末和薄膜样品。用X射线衍射仪和扫描电子显微镜对在(180200300320°C)下沉积和退火的薄膜进行了表征。研究了Urbach尾能Eu和光学能隙Eop。同样,Swanepoel方法显示折射率表现出正常的色散行为。此外,还考察了单振子、色散能、晶格介电常数εL、等离子体频率ωp和光学电导率σop。计算了沉积态和退火态薄膜的电导率和活化能。而沉积态和退火态膜的J-E性质表明,负微分电导NDC的范围随着退火温度的变化而变化。
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Structural, optical, and electrical characteristics of Ge18Bi4Se78 chalcogenide glass for optoelectronic applications

The melt quenching and thermal evaporation techniques were used to produce the chalcogenide glass Ge18Bi4Se78 powder and thin film samples, respectively. The as-deposited and annealed thin films at (180, 200, 300, 320 °C) are characterized by X-ray diffractometer and scanning electron microscopy. The Urbach tail energy Eu and the optical energy gap Eop are investigated. As well, the Swanepoel method revealed that the refractive index exhibited normal dispersion behavior. In addition, the single oscillator, dispersion energies, the lattice dielectric constant, εL, plasma frequency, ωp, and optical conductivity, σop were all examined. The electrical conductivity and the activation energies for as-deposited and annealed thin films were calculated. Whereas the J-E properties of the as-deposited and annealed films indicated varied ranges of negative differential conductance NDC depending on the annealing temperatures.

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