氧化钒化合物:结构、性质和气相生长

Naoufal Bahlawane, Damien Lenoble
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引用次数: 128

摘要

在过去的几十年里,氧化钒的结构驱动特性激发了巨大的发展,特别是作为能源、传感器和光电子的智能材料。在计算生成能的基础上,对氧化钒的各种稳定和亚稳结构进行了讨论,并对其结构相关性质进行了综述。回顾了从气相开始的化学沉积工艺,特别强调了实现的前驱体和获得的氧化钒相。虽然通过这些方法获得了相当一部分相关的氧化钒化合物,但它们的受控细化和响应特性的研究仍然存在有益的挑战。
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Vanadium Oxide Compounds: Structure, Properties, and Growth from the Gas Phase

The structure-driven properties of vanadium oxide have inspired enormous developments in the last decades, especially as a smart material for energy, sensors, and optoelectronics. The large variety of stable and metastable structures of vanadium oxide is discussed, based on the calculated formation energies and a broad overview of their structure-related properties. The established chemical deposition processes from the gas phase are reviewed with a particular emphasis on the implemented precursors and the obtained vanadium oxide phases. Although a significant fraction of relevant vanadium oxide compounds is achieved by these methods, there are still rewarding challenges related to their controlled elaboration and the investigation of their responsive properties.

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来源期刊
Chemical Vapor Deposition
Chemical Vapor Deposition 工程技术-材料科学:膜
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期刊介绍: Chemical Vapor Deposition (CVD) publishes Reviews, Short Communications, and Full Papers on all aspects of chemical vapor deposition and related technologies, along with other articles presenting opinion, news, conference information, and book reviews. All papers are peer-reviewed. The journal provides a unified forum for chemists, physicists, and engineers whose publications on chemical vapor deposition have in the past been spread over journals covering inorganic chemistry, materials chemistry, organometallics, applied physics and semiconductor technology, thin films, and ceramic processing.
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