Anatolii A. Malygin, Victor E. Drozd, Anatolii A. Malkov, Vladimir M. Smirnov
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引用次数: 61
摘要
本文致力于分子分层技术(ML)的创造和发展的历史,在非俄罗斯科学家的现代社区中,通常被称为原子层沉积(ALD)。本文根据1952年V. B. Aleskovskii提出的“框架”假说,讨论了用ML方法进行固体表面化学转化的基础研究。包括参与ALD历史虚拟项目(VPHA, 2013年)的国际科学家、参加赫尔辛基(芬兰,2014年5月)、京都(日本,2014年6月)会议的科学家以及同行之间的个人交流提出的一些问题都得到了解决。这篇文章第一次用英语提供了关于V. B. Aleskovskii和S. I. Kol tsov的信息,他们与苏联ML技术的发展密切相关。本文还向科学界介绍了目前在俄罗斯从事机器学习研究的研究小组,并介绍了由V. B. Aleskovskii创立和监督的“高度组织化物质化学”科学学院。
From V. B. Aleskovskii's “Framework” Hypothesis to the Method of Molecular Layering/Atomic Layer Deposition†
This essay is dedicated to the history of creation and development of the molecular layering technique (ML) which, in the modern community of non-Russian scientists, is commonly referred to as atomic layer deposition (ALD). Basic research in the field of chemical transformations of solid surfaces using the ML method in the light of the “framework” hypothesis proposed by V. B. Aleskovskii in 1952 is discussed. A number of questions raised by international scientists including those involved in the Virtual Project on the History of ALD (VPHA, 2013), and scientists from conferences in Helsinki (Finland, May 2014.), Kyoto (Japan, June 2014), and personal communications amongst peers are addressed. For the first time in English, this article provides information about V. B. Aleskovskii and S. I. Kol'tsov who are closely associated with development of the ML technique in the Soviet Union. This paper also informs the scientific community about research groups currently engaged in ML research in Russia and introduces the scientific school of “Chemistry of highly organized substances”, founded and supervised by V. B. Aleskovskii.
期刊介绍:
Chemical Vapor Deposition (CVD) publishes Reviews, Short Communications, and Full Papers on all aspects of chemical vapor deposition and related technologies, along with other articles presenting opinion, news, conference information, and book reviews. All papers are peer-reviewed. The journal provides a unified forum for chemists, physicists, and engineers whose publications on chemical vapor deposition have in the past been spread over journals covering inorganic chemistry, materials chemistry, organometallics, applied physics and semiconductor technology, thin films, and ceramic processing.