电场气溶胶辅助CVD:单源前驱体制备的氧化锡微球的合成、表征和性能

Rabia Naeem, Sohail Ahmed, Kong Mun Lo, Wan Jefrey Basirun, Rosiyah Yahya, Misni Misran, T. A. Nirmal Peiris, Jagdeep S. Sagu, K. G. Upul Wijayantha, Arjun K. Thapa, Gamini U. Sumanasekera, Muhammad Mazhar
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引用次数: 7

摘要

采用单源前驱体[Sn (OAc)(dmae)]2(其中OAc =醋酸酯,dmae =二甲氨基乙醇酸)合成了氧化锡(IV)微球的介孔纳米结构。利用x射线衍射、场发射扫描电镜(FESEM)、傅里叶变换红外和紫外-可见光谱、x射线光电子能谱和阻抗谱对制备的微球进行了表征。微球的内表面和外表面的聚焦离子束(FIB)图像显示了多孔结构的存在,介孔尺寸分别为56 ~ 66 nm和8.0 ~ 160 nm。与未改性的氧化锡基纳米材料相比,微球具有较高的BET和Langmuir表面积,分别为136和191.6 m2 g−1,并且在60次循环中显示出600 mAhg−1的容量。500mah g−1,50次循环后。
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Electric-Field Aerosol-Assisted CVD: Synthesis, Characterization, and Properties of Tin Oxide Microballs Prepared from a Single Source Precursor†

Mesoporous nanostructures of tin(IV) oxide microballs are synthesized, using a single source precursor [Sn (OAc)(dmae)]2 (where OAc = Acetato and dmae = dimethylaminoethanolato). The as-prepared microballs are characterized using X-ray diffraction, field emission scanning electron microscopy (FESEM), Fourier transform infrared and UV-vis spectroscopy, X-ray photoelectron spectroscopy and impedance spectroscopy. The focused ion beam (FIB) images of the exterior and interior surfaces of the microballs disclosed the presence of porous structures with mesopore of sizes ranging from 56-66 nm and 8.0 to 160 nm, respectively. The microballs exhibit high BET and Langmuir surface areas of 136 and 191.6 m2 g−1, respectively, and show capacities >600 mAhg−1 over 60 cycles, as compared with unmodified tin oxide-based nanomaterials which show capacity < 500 mAh g−1 after 50 cycles.

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来源期刊
Chemical Vapor Deposition
Chemical Vapor Deposition 工程技术-材料科学:膜
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期刊介绍: Chemical Vapor Deposition (CVD) publishes Reviews, Short Communications, and Full Papers on all aspects of chemical vapor deposition and related technologies, along with other articles presenting opinion, news, conference information, and book reviews. All papers are peer-reviewed. The journal provides a unified forum for chemists, physicists, and engineers whose publications on chemical vapor deposition have in the past been spread over journals covering inorganic chemistry, materials chemistry, organometallics, applied physics and semiconductor technology, thin films, and ceramic processing.
期刊最新文献
Low Temperature PureB Technology for CMOS Compatible Photodetectors From V. B. Aleskovskii's “Framework” Hypothesis to the Method of Molecular Layering/Atomic Layer Deposition† Farewell and Welcome Chem. Vap. Deposition (10–11–12/2015) Numerical Modeling of the Droplet Vaporization for Design and Operation of Liquid-pulsed CVD
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