{"title":"气溶胶辅助CVD制备碳二亚胺锌薄膜的捷径","authors":"Karl M. Kaye, William Grantham, Geoffrey Hyett","doi":"10.1002/cvde.201507179","DOIUrl":null,"url":null,"abstract":"<div>\n \n <section>\n \n <p>There has been a resurgence of interest in metal carbodiimides in recent years and in this paper we present a route to the synthesis of one of these phases, zinc carbodiimide, previously known as zinc cyanamide, in the form of a sub-micrometer thin film, using aerosol-assisted (AA)CVD from a solution of zinc acetate and urea in methanol, with the carbodiimide ion being formed from the decomposition of the urea molecule. Thin film synthesis is achieved over a deposition temperature range 375 − 500 °C, with a minimum ratio of urea to zinc acetate of 2:1 and a maximum of 5:1 established as viable for film formation. This work presents the first example of the synthesis of a ZnNCN thin film, or indeed any metal carbodiimide thin film, using a CVD technique.</p>\n </section>\n </div>","PeriodicalId":10093,"journal":{"name":"Chemical Vapor Deposition","volume":"21 10-11-12","pages":"281-287"},"PeriodicalIF":0.0000,"publicationDate":"2015-11-10","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://sci-hub-pdf.com/10.1002/cvde.201507179","citationCount":"9","resultStr":"{\"title\":\"A Facile Route to Thin Films of Zinc Carbodiimide Using Aerosol-assisted CVD\",\"authors\":\"Karl M. Kaye, William Grantham, Geoffrey Hyett\",\"doi\":\"10.1002/cvde.201507179\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"<div>\\n \\n <section>\\n \\n <p>There has been a resurgence of interest in metal carbodiimides in recent years and in this paper we present a route to the synthesis of one of these phases, zinc carbodiimide, previously known as zinc cyanamide, in the form of a sub-micrometer thin film, using aerosol-assisted (AA)CVD from a solution of zinc acetate and urea in methanol, with the carbodiimide ion being formed from the decomposition of the urea molecule. Thin film synthesis is achieved over a deposition temperature range 375 − 500 °C, with a minimum ratio of urea to zinc acetate of 2:1 and a maximum of 5:1 established as viable for film formation. This work presents the first example of the synthesis of a ZnNCN thin film, or indeed any metal carbodiimide thin film, using a CVD technique.</p>\\n </section>\\n </div>\",\"PeriodicalId\":10093,\"journal\":{\"name\":\"Chemical Vapor Deposition\",\"volume\":\"21 10-11-12\",\"pages\":\"281-287\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2015-11-10\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"https://sci-hub-pdf.com/10.1002/cvde.201507179\",\"citationCount\":\"9\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Chemical Vapor Deposition\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://onlinelibrary.wiley.com/doi/10.1002/cvde.201507179\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Chemical Vapor Deposition","FirstCategoryId":"1085","ListUrlMain":"https://onlinelibrary.wiley.com/doi/10.1002/cvde.201507179","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
A Facile Route to Thin Films of Zinc Carbodiimide Using Aerosol-assisted CVD
There has been a resurgence of interest in metal carbodiimides in recent years and in this paper we present a route to the synthesis of one of these phases, zinc carbodiimide, previously known as zinc cyanamide, in the form of a sub-micrometer thin film, using aerosol-assisted (AA)CVD from a solution of zinc acetate and urea in methanol, with the carbodiimide ion being formed from the decomposition of the urea molecule. Thin film synthesis is achieved over a deposition temperature range 375 − 500 °C, with a minimum ratio of urea to zinc acetate of 2:1 and a maximum of 5:1 established as viable for film formation. This work presents the first example of the synthesis of a ZnNCN thin film, or indeed any metal carbodiimide thin film, using a CVD technique.
期刊介绍：
Chemical Vapor Deposition (CVD) publishes Reviews, Short Communications, and Full Papers on all aspects of chemical vapor deposition and related technologies, along with other articles presenting opinion, news, conference information, and book reviews. All papers are peer-reviewed. The journal provides a unified forum for chemists, physicists, and engineers whose publications on chemical vapor deposition have in the past been spread over journals covering inorganic chemistry, materials chemistry, organometallics, applied physics and semiconductor technology, thin films, and ceramic processing.
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