等离子体与引发CVD合成聚合物的光氧化研究

Salmaan H. Baxamusa, Aravind Suresh, Paul Ehrmann, Ted Laurence, Jiries Hanania, Jeff Hayes, Stephen Harley, Daniel D. Burkey
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引用次数: 12

摘要

等离子体聚合物通常受其对自发和光氧化的敏感性所限制。我们证明了反式2-丁烯等离子体聚合物的不寻常的光致发光(PL)行为与其PL强度相关。这些光过程发生在蓝光照明下(λ = 405 nm),区别于传统的紫外线降解聚合物。这些光活性缺陷很可能是在等离子体沉积过程中形成的,我们表明,使用非等离子体方法引发(i)CVD合成的聚合物具有1000倍的低PL信号和光稳定性增强。因此,非等离子体方法,如iCVD,可能是克服限制等离子体聚合物采用的材料老化问题的一条途径。
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Photo-oxidation of Polymers Synthesized by Plasma and Initiated CVD†

Plasma polymers are often limited by their susceptibility to spontaneous and photo-oxidation. We show that the unusual photoluminescence (PL) behavior of a plasma polymer of trans-2-butene is correlated with its PL strength. These photo-processes occur under blue light illumination (λ = 405 nm), distinguishing them from traditional ultraviolet degradation of polymers. These photo-active defects are likely formed during the plasma deposition process, and we show that a polymer synthesized using initiated (i)CVD, a non-plasma method, has 1000× lower PL signal and enhanced photo-stability. Non-plasma methods, such as iCVD, may therefore be a route to overcoming material aging issues that limit the adoption of plasma polymers.

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来源期刊
Chemical Vapor Deposition
Chemical Vapor Deposition 工程技术-材料科学:膜
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>12 weeks
期刊介绍: Chemical Vapor Deposition (CVD) publishes Reviews, Short Communications, and Full Papers on all aspects of chemical vapor deposition and related technologies, along with other articles presenting opinion, news, conference information, and book reviews. All papers are peer-reviewed. The journal provides a unified forum for chemists, physicists, and engineers whose publications on chemical vapor deposition have in the past been spread over journals covering inorganic chemistry, materials chemistry, organometallics, applied physics and semiconductor technology, thin films, and ceramic processing.
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