用CVD聚合法制备微粒均匀涂层

Chemical Vapor Deposition Pub Date : 2015-11-23 DOI:10.1002/cvde.201507197

Yu Liang, Jacob H. Jordahl, Hao Ding, Xiaopei Deng, Joerg Lahann

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引用次数: 4

摘要

研制了一种改进的流化床反应器，利用化学气相沉积技术将反应性聚合物膜均匀地涂在微米级颗粒上。该技术被发现快速(每批约30分钟)和可扩展(高达1g颗粒)，并且可以在直径小至10 μm的微粒上创建均匀涂层。通过调整关键变量，如工作压力和载气流量，可以实现反应性聚合物膜的全覆盖。Janus粒子被合成并可以通过荧光显微镜观察。

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Uniform Coating of Microparticles using CVD Polymerization†

A modified fluidized bed reactor is developed to homogenously coat micrometer-sized particles with reactive polymer films using CVD. This technique is found to be rapid (∼30 min per batch) and scalable (up to 1 g particles), and can create homogenous coatings on microparticles down to 10 μm in diameter. By tuning critical variables, such as working pressure and the carrier gas flow rate, full coverage of a reactive polymer film can be realized. Janus particles are synthesized and can be visualized via fluorescence microscopy.

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来源期刊

Chemical Vapor Deposition 工程技术-材料科学：膜

自引率

0.00%

发文量

审稿时长

>12 weeks

期刊介绍： Chemical Vapor Deposition (CVD) publishes Reviews, Short Communications, and Full Papers on all aspects of chemical vapor deposition and related technologies, along with other articles presenting opinion, news, conference information, and book reviews. All papers are peer-reviewed. The journal provides a unified forum for chemists, physicists, and engineers whose publications on chemical vapor deposition have in the past been spread over journals covering inorganic chemistry, materials chemistry, organometallics, applied physics and semiconductor technology, thin films, and ceramic processing.

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