Ni/Al2O3和Ni/ZrO2纳米复合薄膜的腐蚀行为

IF 0.6 4区 材料科学 Q4 MATERIALS SCIENCE, MULTIDISCIPLINARY Journal of Optoelectronics and Advanced Materials Pub Date : 2011-04-19 DOI:10.5772/13844
G. Constantin, Stasi Iuliana-Valentina, Lalau Cornel-Constantin
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引用次数: 0

摘要

在镀镍液中加入氧化铝和氧化锆纳米粒子,可以改变铜基上电沉积的纳米复合材料薄层的表面形貌和首选晶体取向。镍镀层的典型形貌为金字塔形,但加入浓度在5 ~ 10 g/l之间的氧化铝颗粒后,这种形貌变为半球形。采用极化曲线、阻抗谱和Mott-Schottky技术研究了制备的Ni/ al2o3和Ni/ zro2纳米复合材料薄层在不同溶液中的腐蚀行为。实验结果表明,氧化铝和氧化锆纳米颗粒在纳米复合材料中的有益作用。
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Corrosion Behavior of Ni/Al2O3 and Ni/ZrO2 Nanocomposite Thin Films
The addition of alumina and zirconia nanoparticles into nickel plating bath induces changes in the surface morphology and in the preferred crystallographic orientation of the nanocomposite thin layers electrodeposited on cooper substrates. The typical morphology for nickel deposits is pyramidal, but the addition of alumina particles in concentrations between 5 g/l and 10 g/l changes this morphology to hemispherical. The behavior of prepared Ni/Al 2 O 3 and Ni/ZrO 2 nanocomposite thin layers during corroding process in various solutions was investigated by using polarization curve, impedance spectroscopy, and Mott-Schottky techniques. The experimental results indicate the beneficial roles of alumina and zirconia nanoparticles on nanocomposite materials.
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来源期刊
Journal of Optoelectronics and Advanced Materials
Journal of Optoelectronics and Advanced Materials 工程技术-材料科学:综合
CiteScore
0.90
自引率
20.00%
发文量
0
审稿时长
6.5 months
期刊介绍: The Journal of Optoelectronics and Advanced Materials (J. Optoelectron. Adv. M.) appears with 12 issues per year and publishes papers in the field of optoelectronics, photonics, and new advanced materials (nonlinear optical materials, crystalline and non-crystalline materials, nano-structured materials, magnetic materials, functional and smart materials, materials based on polymers, biomaterials) of relevance for optoelectronics and photonics.
期刊最新文献
Fractal and fracture mechanics analyses of fatigue fracture surfaces of metallic materials Corrosion Behavior of Ni/Al2O3 and Ni/ZrO2 Nanocomposite Thin Films FT -IR and Raman spectroscopic studies of xAg2O-(100-x)[3B2O3·As2O3] glass system Xerographic spectroscopy of gap states: Se-rich amorphous semiconductors Fabrication of octyltriethoxysilane Langmuir-Blodgett thin film
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