化学。Vap。沉积（2015年10月11日至12月）

Chemical Vapor Deposition Pub Date : 2015-12-17 DOI:10.1002/cvde.201571014

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S.Karle，V.-S.Dang，M.Prenzel，D.Rogalla，H.-W.Becker，A.Devi

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Chem. Vap. Deposition (10–11–12/2015)

Metal-organic CVD of Y₂O₃ Thin Films using Yttrium tris-amidinates By S. Karle, V.-S. Dang, M. Prenzel, D. Rogalla, H.-W. Becker, A. Devi

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Chemical Vapor Deposition 工程技术-材料科学：膜

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审稿时长

>12 weeks

期刊介绍： Chemical Vapor Deposition (CVD) publishes Reviews, Short Communications, and Full Papers on all aspects of chemical vapor deposition and related technologies, along with other articles presenting opinion, news, conference information, and book reviews. All papers are peer-reviewed. The journal provides a unified forum for chemists, physicists, and engineers whose publications on chemical vapor deposition have in the past been spread over journals covering inorganic chemistry, materials chemistry, organometallics, applied physics and semiconductor technology, thin films, and ceramic processing.

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