先进喷雾热解法制备含氟氧化锡薄膜的气敏性能

P. S. Shewale, M. Uplane
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引用次数: 1

摘要

采用先进的喷雾热解技术,以氯化锡和氟化铵为前驱体,在低温下在玻璃表面制备了透明的氟掺杂氧化锡导电薄膜。在衬底温度250 ~ 340℃范围内生长薄膜。研究了衬底温度对薄膜结构、形态和硫化氢气敏性能的影响。XRD研究证实了薄膜的四方晶体结构,并且发现所有薄膜本质上都是多晶。在250°C下制备的FTO薄膜在250°C工作温度下表现出最大的灵敏度(~ 10%)。进一步研究了钯敏化对250°C样品H2S传感性能的影响,获得了增强的传感响应。
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Gas sensing properties of the fluorine-doped tin oxide thin films Prepared by advanced spray pyrolysis
Transparent conducting fluorine-doped tin oxide (FTO) thin films were prepared onto glass at low substrate temperature by an advanced spray pyrolysis technique, with stannic chloride and ammonium fluoride as precursors. The films were grown at different substrate temperatures varied in the range of 250–340°C. The effect of the substrate temperature on the structural, morphological, and hydrogen sulphide (H2S) gas sensing properties of the films has been investigated. XRD studies confirm tetragonal crystal structure of the films and all the films are found to be polycrystalline in nature. The FTO film prepared at 250°C exhibits the maximum sensitivity (∼ 10 %) at 250°C operating temperature. Further, the effect of palladium sensitization on the H2S sensing properties of the 250°C sample has been studied and an enhanced sensing response was obtained.
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