YBaCuO薄膜的外延生长与性能

J. Geerk, G. Linker, O. Meyer
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引用次数: 135

摘要

利用x射线衍射和通道实验研究了在不同衬底(Al2O3, MgO, SrTiO3, Zr(Y)O2)上溅射沉积YBaCuO薄膜的生长质量与沉积温度的关系。除了衬底取向外,衬底温度是决定薄膜生长方向是c、a、(110)还是混合方向的参数。在77 K下,外延生长与薄膜中高达5.5 × 106 A/cm2的高临界电流值相关。生长出厚度低至2纳米的超薄薄膜,显示出三维超导行为。9nm及以下厚度的(100)SrTiO3薄膜部分应变,显示出相应的生长。通过对表面无序性的分析,得到每Ba2Y行有0.5个位移的Ba原子,表明无序层厚度约为0.3 nm。在这些薄膜上制备的隧道结在±16 mV和±30 mV附近显示出类似缝隙的结构。
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Epitaxial growth and properties of YBaCuO thin films

The growth quality of YBaCuO thin films deposited by sputtering on different substrates (Al2O3, MgO, SrTiO3, Zr(Y)O2) has been studied by X-ray diffraction and channeling experiments as a function of the deposition temperature. Besides the substrate orientation, the substrate temperature is the parameter determining whether films grow in c, a, (110) or mixed directions. Epitaxial growth correlates with high critical current values in the films of up to 5.5 × 106 A/cm2 at 77 K. Ultrathin films with thicknesses down to 2 nm were grown revealing three-dimensional superconducting behaviour. Films on (100) SrTiO3 of 9 nm thickness and below are partially strained indicating commensurate growth. From the analysis of the surface disorder 0.5 displaced Ba atom per Ba2Y row was obtained indicating that the disordered layer thickness is about 0.3 nm. Tunnel junctions fabricated on these films reveal gap-like structures near ±16 mV and ± 30 mV.

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