Al/Cu/W焊盘微腐蚀的表征

G. Gong, Li Li, Wei Liu, M. Song, Xue-Song Xu, D.H. Ye, J. Yao
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引用次数: 2

摘要

本文对Al/Cu/W焊盘的微腐蚀进行了研究。在DI水清洗过程中,θ相Al2Cu和周围Al表现良好,与典型原电池一样,导致焊盘金属微腐蚀。含Pb2+的去离子水被认为在原电池的电路外。结果表明,Al2Cu表面的含pb颗粒和周围的氧化铝和/或氢氧化物分别是阴极反应产物和阳极反应产物。
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Characterization of Al/Cu/W bond pad micro-corrosion
In this paper, micro-corrosion of Al/Cu/W bond pad was studied. During DI water cleaning process, theta phase Al2Cu and surrounding Al performed well as typical galvanic cell, resulting in pad metal micro-corrosion. DI water with Pb2+ is thought to be outside electrical path of the galvanic cell. It is firmly believed that Pb-contained particles on top of Al2Cu and surrounding Al oxide and/or hydroxide were the cathodic and anodic reaction product respectively.
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