F. Iker, M. Si Moussa, N. André, T. Pardoen, J. Raskin
{"title":"基于薄膜SOI技术的CMOS兼容三维自组装微结构","authors":"F. Iker, M. Si Moussa, N. André, T. Pardoen, J. Raskin","doi":"10.1109/ICSENS.2004.1426371","DOIUrl":null,"url":null,"abstract":"3D self-assembled microstructures are processed based on thin film SOI wafers. Self assembled structures going from meander inductors to flow sensors are obtained from using only one photolithographic step. The assembly of our microstructures relies on the thermal expansion mismatch between the material layers as well as control of the plastic flow of one of the layers.","PeriodicalId":20476,"journal":{"name":"Proceedings of IEEE Sensors, 2004.","volume":"244 1","pages":"1113-1116 vol.3"},"PeriodicalIF":0.0000,"publicationDate":"2004-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"3","resultStr":"{\"title\":\"CMOS compatible 3-D self assembled microstructures using thin film SOI technology\",\"authors\":\"F. Iker, M. Si Moussa, N. André, T. Pardoen, J. Raskin\",\"doi\":\"10.1109/ICSENS.2004.1426371\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"3D self-assembled microstructures are processed based on thin film SOI wafers. Self assembled structures going from meander inductors to flow sensors are obtained from using only one photolithographic step. The assembly of our microstructures relies on the thermal expansion mismatch between the material layers as well as control of the plastic flow of one of the layers.\",\"PeriodicalId\":20476,\"journal\":{\"name\":\"Proceedings of IEEE Sensors, 2004.\",\"volume\":\"244 1\",\"pages\":\"1113-1116 vol.3\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2004-01-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"3\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Proceedings of IEEE Sensors, 2004.\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/ICSENS.2004.1426371\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Proceedings of IEEE Sensors, 2004.","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ICSENS.2004.1426371","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
CMOS compatible 3-D self assembled microstructures using thin film SOI technology
3D self-assembled microstructures are processed based on thin film SOI wafers. Self assembled structures going from meander inductors to flow sensors are obtained from using only one photolithographic step. The assembly of our microstructures relies on the thermal expansion mismatch between the material layers as well as control of the plastic flow of one of the layers.