{"title":"瑞利还是阿贝?微光刻解析度公式的起源及命名","authors":"A. Yen","doi":"10.1117/1.jmm.19.4.040501","DOIUrl":null,"url":null,"abstract":"We review the history in connection with the resolution formula of microlithography and argue that it was Abbe rather than Rayleigh who definitively stated the 0.5λNA resolution limit for the minimum pitch first, using an approach more relevant to projection imaging, and hence, this expression should be more appropriately referred to as the Abbe formula for the resolution of a projection imaging system.","PeriodicalId":16522,"journal":{"name":"Journal of Micro/Nanolithography, MEMS, and MOEMS","volume":"1 1","pages":""},"PeriodicalIF":1.5000,"publicationDate":"2020-11-06","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"8","resultStr":"{\"title\":\"Rayleigh or Abbe? Origin and naming of the resolution formula of microlithography\",\"authors\":\"A. Yen\",\"doi\":\"10.1117/1.jmm.19.4.040501\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"We review the history in connection with the resolution formula of microlithography and argue that it was Abbe rather than Rayleigh who definitively stated the 0.5λNA resolution limit for the minimum pitch first, using an approach more relevant to projection imaging, and hence, this expression should be more appropriately referred to as the Abbe formula for the resolution of a projection imaging system.\",\"PeriodicalId\":16522,\"journal\":{\"name\":\"Journal of Micro/Nanolithography, MEMS, and MOEMS\",\"volume\":\"1 1\",\"pages\":\"\"},\"PeriodicalIF\":1.5000,\"publicationDate\":\"2020-11-06\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"8\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Journal of Micro/Nanolithography, MEMS, and MOEMS\",\"FirstCategoryId\":\"101\",\"ListUrlMain\":\"https://doi.org/10.1117/1.jmm.19.4.040501\",\"RegionNum\":2,\"RegionCategory\":\"物理与天体物理\",\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q3\",\"JCRName\":\"ENGINEERING, ELECTRICAL & ELECTRONIC\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Journal of Micro/Nanolithography, MEMS, and MOEMS","FirstCategoryId":"101","ListUrlMain":"https://doi.org/10.1117/1.jmm.19.4.040501","RegionNum":2,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q3","JCRName":"ENGINEERING, ELECTRICAL & ELECTRONIC","Score":null,"Total":0}
Rayleigh or Abbe? Origin and naming of the resolution formula of microlithography
We review the history in connection with the resolution formula of microlithography and argue that it was Abbe rather than Rayleigh who definitively stated the 0.5λNA resolution limit for the minimum pitch first, using an approach more relevant to projection imaging, and hence, this expression should be more appropriately referred to as the Abbe formula for the resolution of a projection imaging system.
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