瑞利还是阿贝?微光刻解析度公式的起源及命名

IF 1.5 2区 物理与天体物理 Q3 ENGINEERING, ELECTRICAL & ELECTRONIC Journal of Micro/Nanolithography, MEMS, and MOEMS Pub Date : 2020-11-06 DOI:10.1117/1.jmm.19.4.040501
A. Yen
{"title":"瑞利还是阿贝?微光刻解析度公式的起源及命名","authors":"A. Yen","doi":"10.1117/1.jmm.19.4.040501","DOIUrl":null,"url":null,"abstract":"We review the history in connection with the resolution formula of microlithography and argue that it was Abbe rather than Rayleigh who definitively stated the 0.5λNA resolution limit for the minimum pitch first, using an approach more relevant to projection imaging, and hence, this expression should be more appropriately referred to as the Abbe formula for the resolution of a projection imaging system.","PeriodicalId":16522,"journal":{"name":"Journal of Micro/Nanolithography, MEMS, and MOEMS","volume":null,"pages":null},"PeriodicalIF":1.5000,"publicationDate":"2020-11-06","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"8","resultStr":"{\"title\":\"Rayleigh or Abbe? Origin and naming of the resolution formula of microlithography\",\"authors\":\"A. Yen\",\"doi\":\"10.1117/1.jmm.19.4.040501\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"We review the history in connection with the resolution formula of microlithography and argue that it was Abbe rather than Rayleigh who definitively stated the 0.5λNA resolution limit for the minimum pitch first, using an approach more relevant to projection imaging, and hence, this expression should be more appropriately referred to as the Abbe formula for the resolution of a projection imaging system.\",\"PeriodicalId\":16522,\"journal\":{\"name\":\"Journal of Micro/Nanolithography, MEMS, and MOEMS\",\"volume\":null,\"pages\":null},\"PeriodicalIF\":1.5000,\"publicationDate\":\"2020-11-06\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"8\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Journal of Micro/Nanolithography, MEMS, and MOEMS\",\"FirstCategoryId\":\"101\",\"ListUrlMain\":\"https://doi.org/10.1117/1.jmm.19.4.040501\",\"RegionNum\":2,\"RegionCategory\":\"物理与天体物理\",\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q3\",\"JCRName\":\"ENGINEERING, ELECTRICAL & ELECTRONIC\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Journal of Micro/Nanolithography, MEMS, and MOEMS","FirstCategoryId":"101","ListUrlMain":"https://doi.org/10.1117/1.jmm.19.4.040501","RegionNum":2,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q3","JCRName":"ENGINEERING, ELECTRICAL & ELECTRONIC","Score":null,"Total":0}
引用次数: 8

摘要

我们回顾了与微光刻分辨率公式相关的历史,并认为是阿贝而不是瑞利首先明确地提出了最小间距0.5λNA的分辨率限制,使用了与投影成像更相关的方法,因此,这个表达式应该更合适地称为投影成像系统分辨率的阿贝公式。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
查看原文
分享 分享
微信好友 朋友圈 QQ好友 复制链接
本刊更多论文
Rayleigh or Abbe? Origin and naming of the resolution formula of microlithography
We review the history in connection with the resolution formula of microlithography and argue that it was Abbe rather than Rayleigh who definitively stated the 0.5λNA resolution limit for the minimum pitch first, using an approach more relevant to projection imaging, and hence, this expression should be more appropriately referred to as the Abbe formula for the resolution of a projection imaging system.
求助全文
通过发布文献求助,成功后即可免费获取论文全文。 去求助
来源期刊
CiteScore
3.40
自引率
30.40%
发文量
0
审稿时长
6-12 weeks
期刊最新文献
Rayleigh or Abbe? Origin and naming of the resolution formula of microlithography JM3 is Gone, Long Live JM3! Direct comparison of line edge roughness measurements by SEM and a metrological tilting-atomic force microscopy for reference metrology Resolution enhancement with source-wavelength optimization according to illumination angle in optical lithography Particle and pattern discriminant freeze-cleaning method
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
现在去查看 取消
×
提示
确定
0
微信
客服QQ
Book学术公众号 扫码关注我们
反馈
×
意见反馈
请填写您的意见或建议
请填写您的手机或邮箱
已复制链接
已复制链接
快去分享给好友吧!
我知道了
×
扫码分享
扫码分享
Book学术官方微信
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术
文献互助 智能选刊 最新文献 互助须知 联系我们:info@booksci.cn
Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。
Copyright © 2023 Book学术 All rights reserved.
ghs 京公网安备 11010802042870号 京ICP备2023020795号-1