ZnO薄膜带边态随退火环境气氛的热演化

Hyun Woo Park, Jin-seong Park, J. Lee, K. Chung
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引用次数: 33

摘要

rf溅射ZnO薄膜在不同的退火环境下进行了退火,包括真空、空气和水蒸气。研究了ZnO薄膜在不同气氛下退火后的物理和电学性能与退火温度的关系。在真空或水蒸气中退火时,载流子浓度急剧增加,迁移率降低。尽管退火环境气氛和温度不同,但退火后ZnO薄膜的择优取向和结晶都保持不变。然而,通过椭偏光谱测量,观察到导电带以下的两个不同的能带边缘状态,作为退火环境气氛的函数发生了热变化,这些变化与载流子浓度和迁移率的变化有关。
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Thermal Evolution of Band Edge States in ZnO Film as a Function of Annealing Ambient Atmosphere
RF-sputtered ZnO films were annealed under various annealing ambient atmospheres, including a vacuum, air, and water vapor. The physical and electrical properties of ZnO films annealed in various ambient atmospheres, were studied as a function of annealing temperature. The carrier concentration was dramatically increased, and the mobility was decreased when the films were annealed in a vacuum or water vapor. Even though the annealing ambient atmosphere and temperature were different, the preferred orientation and crystallization of the annealed ZnO films are maintained. However, two distinct band edge states below the conduction band, observed by spectroscopic ellipsometry measurement, undergo a thermal change as a function of annealing ambient atmosphere and these changes are correlated to changes in carrier concentration and mobility.
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来源期刊
Electrochemical and Solid State Letters
Electrochemical and Solid State Letters 工程技术-材料科学:综合
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