在GaAs上生长的$\ mathm {GaAs}_{1-\ mathm {x}}\ mathm {Bi}_{\ mathm {x}} $的光致发光和拉曼研究

L. Hasanah, C. Julian, B. Mulyanti, A. Aransa, R. Sumatri, M. H. Johari, J. David, A. Mohmad
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摘要

采用光致发光(PL)和拉曼光谱研究了生长速率对$\ mathm {GaAs}_{1-\ mathm {x}}\ mathm {sBi} {\ mathm {x}}$合金的影响。样品生长在0.09 ~ 0.5 $\mu\mathrm{m}/\mathrm{hour}$,在室温下,生长在0.23 $\mu\mathrm{m}/\mathrm{hour}$的样品获得了最低的PL峰值能量(1.07 eV)。在低于和高于0.23 $\mu\mathrm{m}/\mathrm{hour}$时生长的样品分别出现了PL峰值能量红移和蓝移。拉曼数据显示在162、228、270和295 cm−1处的峰值对应于类砷化镓声子。在183和213 cm−1处也观察到类GaBi声子,但其强度明显弱于类GaAs声子。PL和Raman数据表明,Bi在GaAs晶格中的掺入取决于生长速率,在本研究中,在0.23 $\mu \ mathm {m}/\ mathm {hour}$生长的样品中获得了最高的Bi浓度。
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Photoluminescence and Raman Studies on $\mathrm{GaAs}_{1-\mathrm{x}}\mathrm{Bi}_{\mathrm{X}}$ Grown on GaAs
Photoluminescence (PL) and Raman studies were carried out to investigate the effect of growth rate on $\mathrm{GaAs}_{1-\mathrm{x}}\mathrm{sBi}_{\mathrm{x}}$ alloys. The samples were grown between 0.09 and 0.5 $\mu\mathrm{m}/\mathrm{hour}$, At room temperature, the lowest PL peak energy (1.07 eV) was obtained by sample grown at 0.23 $\mu\mathrm{m}/\mathrm{hour}$. Samples grown at lower and higher than 0.23 $\mu\mathrm{m}/\mathrm{hour}$ showed PL peak energy redshift and blueshift, respectively. Raman data show peaks at 162, 228, 270 and 295 cm−1which correspond to the GaAs like phonons. The GaBi like phonons were also observed at 183 and 213 cm−1but their intensity are significantly weaker compared to GaAs like phonons. PL and Raman data show that Bi incorporation into GaAs lattice is dependent on the growth rate and in this study, the highest Bi concentration was obtained for sample grown at 0.23 $\mu \mathrm{m}/\mathrm{hour}$.
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