在1d-1dEdge重叠的TFET中隧道电流增强

S. Agarwal, E. Yablonovitch
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引用次数: 2

摘要

为了降低现代电子产品的功耗,需要显著降低工作电压。隧道场效应晶体管(TFET)有潜力做到这一点。如图所示,只要导带和价带重叠,电流就可以流动。然而,导通的形状取决于每个能带的态密度(DOS)。DOS可以通过改变设备的维度来控制。
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Enhanced tunneling current in 1d-1dEdge overlapped TFET's
In order to reduce the power consumption of modern electronics, the operating voltage needs to be significantly reduced. Tunneling field effect transistors (TFET's) have the potential to do this. As shown in figure, current can flow as soon as the conduction band and valence band overlap. However, the shape of the turn on is dependent on the density of states (DOS) of each band. The DOS can be controlled by changing the dimensionality of the device.
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