WSe2/石墨烯/NiSex/Ni(111)异质结构的制备与电子结构

Roberto Sant, M. Cattelan, S. Agnoli, G. Granozzi
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摘要

在这项工作中,通过可扩展和高效的方法,创建了由单层WSe2和石墨烯组成的堆叠异质结构。石墨烯生长在Ni(111)单晶上,产生有序且定义明确的碳层,与载体强烈杂化,破坏其特有的导电性能。通过金属W和元素Se的同时蒸发,在石墨烯表面沉积了一层单层WSe2。我们在这里证明了硫可以有效地插入石墨烯和Ni表面之间,使两种材料解耦并形成缓冲的NiSex层。W和Ni的同时硒化有效地消除了在合成独立的石墨烯/Ni异质结构时需要额外的解耦步骤。采用低能电子衍射、x射线光电子能谱、角度分辨紫外光电子能谱、非原位拉曼光谱等手段研究了WSe2/石墨烯/NiSex/Ni(111)异质结构配合物的形成过程。这些分析证实了单层WSe2在独立石墨烯上的存在。
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Preparation and electronic structure of the WSe2/graphene/NiSex/Ni(111) heterostructure
In this work, a stacked heterostructure made up of single-layer WSe2 and graphene was created through a scalable and efficient way. Graphene was grown on a Ni (111) single crystal, producing an ordered and well-defined carbon overlayer that is strongly hybridized with the support, disrupting its peculiar conductive properties. A monolayer WSe2 was deposited on top of graphene by the simultaneous evaporation of metal W and elemental Se. We demonstrate here that the chalcogen can efficiently intercalate between graphene and the Ni surface, decoupling the two materials and forming a buffering NiSex layer. The concurrent selenization of both W and Ni effectively eliminates the need for an additional decoupling step in the synthesis of a free-standing graphene/Ni heterostructure. The formation process of the complex WSe2/Graphene/NiSex/Ni(111) heterostructure was studied by means of low-energy electron diffraction, x-ray photoelectron spectroscopy, angle-resolved ultraviolet photoelectron spectroscopy, and ex situ Raman spectroscopy. These analyses confirm the presence of single-layer WSe2 on top of a free-standing graphene.
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