高取向La掺杂(K, Na)NbO3铁电薄膜

X. Vendrell, L. Mestres, O. Raymond, D. A. Ochoa, J. García
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引用次数: 0

摘要

采用化学溶液沉积法合成了无铅(K0.5Na0.5)1-3xLaxNbO3 (x = 0.0-0.005)薄膜。x射线分析表明,(K0.5Na0.5)NbO3 (KNN)和La掺杂的KNN单相薄膜具有[100]择优取向。当掺杂La时,薄膜表现出非常低的漏电流和更高的介电性能。
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Highly oriented La doped (K, Na)NbO3 ferroelectric thin films
Lead-free (K0.5Na0.5)1-3xLaxNbO3 (x = 0.0-0.005) thin films were synthesized by chemical solution deposition. The X-ray analysis showed that (K0.5Na0.5)NbO3 (KNN) and La doped KNN single-phase thin films were obtained with a [100] preferred orientation. When doping with La, thin films exhibited a remarkably low leakage current and higher dielectric properties.
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