纳米压印压缩PDMS弹性体制备灵敏度增强的SERS衬底

2013 International Conference on Optical MEMS and Nanophotonics (OMN) Pub Date : 2013-11-11 DOI:10.1109/OMN.2013.6659098

W. Kuo, Jiayue Yan, W. Chou, H. Yu

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摘要

本文报道了一种利用纳米压印技术低成本制备增敏SERS衬底的方法。采用压缩的方法对具有光栅结构的PDMS弹性体进行变形，以获得更好的SERS基片间距。实验结果表明，该方法可将灵敏度提高约3倍。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

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Sensitivity-enhanced SERS substrate fabrication by nanoimprinting compressed PDMS elastomer

This paper reports a low-cost fabrication method of sensitivity-enhanced SERS substrate using nanoimprinting lithography. A PDMS elastomer with grating structure is deformed by compressing to achieve the better pitch for SERS substrate. Experimental results show that the sensitivity can be enhanced about three times by this method.

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2013 International Conference on Optical MEMS and Nanophotonics (OMN)

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