纳米晶石墨/p-Si肖特基二极管的电学行为

S. M. Sultan, S. H. Pu, S. Fishlock, L. H. Wah, H. Chong, J. McBride
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引用次数: 6

摘要

研究了纳米晶石墨(NCG)在p型硅肖特基二极管上的电特性。采用无金属催化等离子体增强化学气相沉积(PECVD)和光刻模式转移方法在6英寸晶圆上制备了NCG/p-Si肖特基二极管。NCG薄膜由~35 nm大小的纳米级颗粒组成。NCG/p-Si肖特基二极管具有整流特性,肖特基势垒高度为0.58 eV。这一结果除了纳米颗粒外,还可以用于各种化学和气体传感器应用。
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Electrical behavior of nanocrystalline graphite/p-Si Schottky diode
The electrical characteristics of nanocrystalline graphite (NCG) on p-type Si Schottky diodes were investigated. The NCG/p-Si Schottky diodes were fabricated on a 6-inch wafer by metal-free catalyst plasma enhanced chemical vapour deposition (PECVD) and photolithography pattern transfer method. The NCG film consists of nanoscale grains of ~35 nm in size. The NCG/p-Si Schottky diode shows rectifying behavior with Schottky barrier height of 0.58 eV. This result in addition to nanosized grains can be exploited towards various chemical and gas sensor applications.
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