工作带宽> 415nm的全硅片上偏光片

Weixi Liu, D. Dai, Yaocheng Shi
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引用次数: 1

摘要

我们通过在340 nm SOI上引入双槽欧拉弯曲,提出并演示了一种全硅TM偏振器,在> 415 nm工作带宽下,实验额外损耗< 1 dB,偏振消光比> 25 dB。
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All-Silicon On-Chip Polarizer with> 415 nm working bandwidth
We proposed and demonstrated an all-silicon TM polarizer by introducing double-slot Euler bending on 340-nm SOI with experimental excess loss < 1 dB and polarization extinction ratio> 25 dB over> 415-nm working bandwidth.
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