65纳米及以上的亚稳态挑战;模拟与测量

S. Beer, R. Ginosar, Jerome Cox, Tom Chaney, D. Zar
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引用次数: 15

摘要

最近同步器亚稳态测量表明,随着技术的缩放,MTBF的退化,需要65nm及以下的测量和校准电路。如果系统在极端的电源电压和温度条件下运行,参数的退化可能会更严重。在这项工作中,我们研究了同步器在广泛的电源电压和温度角范围内的行为。提出了一种数字片上测量系统,有助于表征未来技术中的同步器,并展示了一种新的校准系统,该系统考虑了由于电源电压和温度变化而导致的延迟值的变化。我们提出了一个制造65nm块体CMOS电路的测量和模拟的详细比较,并讨论了65nm及以上同步系统测量的含义。我们提出了一个自适应自校准同步器,以考虑电源电压,温度,全局过程变化和DVFS。
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Metastability challenges for 65nm and beyond; simulation and measurements
Recent synchronizer metastability measurements indicate degradation of MTBF with technology scaling, calling for measurement and calibration circuits in 65nm and below. Degradation of parameters can be even worse if the system is operated at extreme supply voltages and temperature conditions. In this work we study the behavior of synchronizers in a broad range of supply voltage and temperature corners. A digital on-chip measurement system is presented that helps to characterize synchronizers in future technologies and a new calibrating system is shown that accounts for changes in delay values due to supply voltage and temperature changes. We present a detailed comparison of measurements and simulations for a fabricated 65nm bulk CMOS circuit and discuss implications of the measurements for synchronization systems in 65nm and beyond. We propose an adaptive self-calibrating synchronizer to account for supply voltage, temperature, global process variations and DVFS.
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