{"title":"ZnO模板上(ZnO)x(InN)1−x薄膜的电学性能与表面平整度的关系","authors":"K. Matsushima, M. Shiratani, N. Itagaki","doi":"10.1109/NANO.2016.7751421","DOIUrl":null,"url":null,"abstract":"We have studied effects of deposition temperature on electrical properties of (ZnO)<sub>x</sub>(InN)<sub>1-x</sub> (ZION) films on ZnO templates. With increasing the deposition temperature from RT to 450°C, the electron mobility decreases from 93 cm<sup>2</sup>/Vs to 70 cm<sup>2</sup>/Vs and the carrier density increases from 1.8×10<sup>19</sup> cm<sup>-3</sup> to 3.4×10<sup>19</sup> cm<sup>-3</sup>. Furthermore, we found a correlation between electrical properties and root mean square (RMS) roughness of the films. These results suggest the surface flatness is an important parameter to determine electrical properties of ZION films.","PeriodicalId":6646,"journal":{"name":"2016 IEEE 16th International Conference on Nanotechnology (IEEE-NANO)","volume":"1 1","pages":"674-675"},"PeriodicalIF":0.0000,"publicationDate":"2016-11-21","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Relationship between electric properties and surface flatness of (ZnO)x(InN)1−x films on ZnO templates\",\"authors\":\"K. Matsushima, M. Shiratani, N. Itagaki\",\"doi\":\"10.1109/NANO.2016.7751421\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"We have studied effects of deposition temperature on electrical properties of (ZnO)<sub>x</sub>(InN)<sub>1-x</sub> (ZION) films on ZnO templates. With increasing the deposition temperature from RT to 450°C, the electron mobility decreases from 93 cm<sup>2</sup>/Vs to 70 cm<sup>2</sup>/Vs and the carrier density increases from 1.8×10<sup>19</sup> cm<sup>-3</sup> to 3.4×10<sup>19</sup> cm<sup>-3</sup>. Furthermore, we found a correlation between electrical properties and root mean square (RMS) roughness of the films. These results suggest the surface flatness is an important parameter to determine electrical properties of ZION films.\",\"PeriodicalId\":6646,\"journal\":{\"name\":\"2016 IEEE 16th International Conference on Nanotechnology (IEEE-NANO)\",\"volume\":\"1 1\",\"pages\":\"674-675\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2016-11-21\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2016 IEEE 16th International Conference on Nanotechnology (IEEE-NANO)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/NANO.2016.7751421\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2016 IEEE 16th International Conference on Nanotechnology (IEEE-NANO)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/NANO.2016.7751421","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Relationship between electric properties and surface flatness of (ZnO)x(InN)1−x films on ZnO templates
We have studied effects of deposition temperature on electrical properties of (ZnO)x(InN)1-x (ZION) films on ZnO templates. With increasing the deposition temperature from RT to 450°C, the electron mobility decreases from 93 cm2/Vs to 70 cm2/Vs and the carrier density increases from 1.8×1019 cm-3 to 3.4×1019 cm-3. Furthermore, we found a correlation between electrical properties and root mean square (RMS) roughness of the films. These results suggest the surface flatness is an important parameter to determine electrical properties of ZION films.
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