交联聚合物薄膜中发色团分子取向控制的周期性极化[用于SHG]

T. Kinoshita, M. Kato
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引用次数: 0

摘要

提出了一种利用分子取向控制交联聚合物的周期性极化过程。用2,2′-偶氮双丁腈在四氢呋喃中以60℃聚合甲基丙烯酸缩水甘油酯(GMA)。1小时。聚gma溶解于含非线性光学发色团的二甲基甲酰胺中,分散红1 (DR1)或分散橙3 (DO3),以4,4′-二氨基二苯基甲烷为交联剂,自旋涂覆在耐热玻璃衬底上。将膜干燥后,在100℃下进行交联热处理1小时。发色团分子被固定在交联聚合物网络中。为了使薄膜形成周期性结构,采用光刻和O/sub /等离子体反应离子刻蚀的方法。不含交联剂的含发色团Poly-GMA被自旋涂覆以填充蚀刻的光栅凹槽。将膜在100℃条件下加热1小时。由于转变温度升高,交联部分未极性化,膜周期性极性化。
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Periodically poling by chromophore molecule orientation control in cross-linked polymer film [for SHG]
We present a process for periodically poling using molecular orientation control in cross-linked polymer. Glycidylmethacrylate (GMA) was polymerized by 2,2'-azobisbutyronitrile in tetrahydrofuran at 60/spl deg/C. for 1 hour. Poly-GMA dissolved in dimethylformamide containing nonlinear optical chromophore, disperse red 1 (DR1) or disperse orange 3 (DO3), and 4,4'-diaminodiphenylmethane as cross-linker was spin-coated on pyrex glass substrates. The films were dried and heat-treated for cross-linking at 100/spl deg/C for 1 hour. The chromophore molecule was fixed in the crosslinked polymer network. To form a periodical structure the films were patterned by photolithography and reactive ion etching using O/sub 2/ plasma. Poly-GMA without cross-linker containing the chromophore was spin-coated to fill the etched grating grooves. The films were poled at 100/spl deg/C for 1 hour. The films were periodically poled because the cross-linked part was not poled due to the raised transition temperature.
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