石墨烯纳米网接触及其输运性质

T. Chu, Zhihong Chen
{"title":"石墨烯纳米网接触及其输运性质","authors":"T. Chu, Zhihong Chen","doi":"10.1109/DRC.2012.6257037","DOIUrl":null,"url":null,"abstract":"This paper present a study that combines the advantages of GNM with the use of few layer graphene (FLG). In particular, by creating the nanomesh structure in the contact area of the FLG, we are able to achieve two previously unrealized feats: 1) We obtain a substantially reduced contact resistance through the contact to multiple graphene layers and 2) we are able to observe on/off current ratios that rival those in SLG FETs. Based on these findings and a detailed study comparing the impact of scattering in GNM FETs and conventional graphene FETs, we are concluding that FLG FETs with GNM contacts are an excellent choice for future generations of graphene based devices.","PeriodicalId":6808,"journal":{"name":"70th Device Research Conference","volume":"23 1","pages":"185-186"},"PeriodicalIF":0.0000,"publicationDate":"2012-06-18","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"2","resultStr":"{\"title\":\"Graphene nanomesh contacts and its transport properties\",\"authors\":\"T. Chu, Zhihong Chen\",\"doi\":\"10.1109/DRC.2012.6257037\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"This paper present a study that combines the advantages of GNM with the use of few layer graphene (FLG). In particular, by creating the nanomesh structure in the contact area of the FLG, we are able to achieve two previously unrealized feats: 1) We obtain a substantially reduced contact resistance through the contact to multiple graphene layers and 2) we are able to observe on/off current ratios that rival those in SLG FETs. Based on these findings and a detailed study comparing the impact of scattering in GNM FETs and conventional graphene FETs, we are concluding that FLG FETs with GNM contacts are an excellent choice for future generations of graphene based devices.\",\"PeriodicalId\":6808,\"journal\":{\"name\":\"70th Device Research Conference\",\"volume\":\"23 1\",\"pages\":\"185-186\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2012-06-18\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"2\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"70th Device Research Conference\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/DRC.2012.6257037\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"70th Device Research Conference","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/DRC.2012.6257037","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 2

摘要

本文将GNM的优点与少层石墨烯(FLG)的使用相结合。特别是,通过在FLG的接触区域创建纳米网格结构,我们能够实现两个以前未实现的壮举:1)我们通过与多个石墨烯层的接触获得了显着降低的接触电阻,2)我们能够观察到与SLG fet相媲美的通/关电流比。基于这些发现以及对GNM fet和传统石墨烯fet中散射影响的详细研究,我们得出结论,具有GNM触点的FLG fet是未来几代石墨烯基器件的绝佳选择。
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Graphene nanomesh contacts and its transport properties
This paper present a study that combines the advantages of GNM with the use of few layer graphene (FLG). In particular, by creating the nanomesh structure in the contact area of the FLG, we are able to achieve two previously unrealized feats: 1) We obtain a substantially reduced contact resistance through the contact to multiple graphene layers and 2) we are able to observe on/off current ratios that rival those in SLG FETs. Based on these findings and a detailed study comparing the impact of scattering in GNM FETs and conventional graphene FETs, we are concluding that FLG FETs with GNM contacts are an excellent choice for future generations of graphene based devices.
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